SCHEMBL3142138

SCHEMBL3142138

CC=CCn1sc2ccccc2c1=O

nearest known ligand 0.67

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CASP3 P42574 7/20 0.67
FAAH O00519 1/20 0.54
MGLL Q99685 1/20 0.54
KAT2A Q92830 3/20 0.52
KAT2B Q92831 3/20 0.52
G6PD P11413 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29679341 1.00 CASP3 (0.67) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL758699 0.80 CASP3 (1.00) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL3143600 0.78 CASP3 (1.00) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL29678965 0.78 CASP3 (1.00) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL16071405 0.78 CASP3 (0.68) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL17948304 0.77 CASP3 (0.72) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL11278746 0.77 CASP3 (0.74) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL29679134 0.77 CASP3 (0.67) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL1123439 0.77 CASP3 (0.67) CASP3FAAHMGLLKAT2AKAT2B
SCHEMBL16916878 0.76 CASP3 (0.83) CASP3FAAHMGLLKAT2AKAT2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113036132-B Polymer composition for nonaqueous secondary battery and nonaqueous secondary battery 旭化成株式会社 2024-06-14 CN disclosed
CN-116529274-A Polymer composition for nonaqueous secondary battery and nonaqueous secondary battery 旭化成株式会社 2023-08-01 CN disclosed
CN-113036132-A Polymer composition for nonaqueous secondary battery and nonaqueous secondary battery 旭化成株式会社 2021-06-25 CN disclosed
CN-113036133-A Polymer composition for nonaqueous secondary battery, and nonaqueous secondary battery 旭化成株式会社 2021-06-25 CN disclosed
EP-2110426-B1 METALWORKING FLUID AND METALWORKING METHOD KYODO YUSHI (JP) 2013-10-16 EP disclosed
US-8375755-B2 Metal working fluid composition and metal working method KYODO YUSHI CO., LTD. (JP) 2013-02-19 US disclosed
US-20100077817-A1 METAL WORKING FLUID COMPOSITION AND METAL WORKING METHOD KYODO YUSHI CO., LTD. (JP) 2010-04-01 US disclosed
EP-2110426-A1 METALWORKING FLUID AND METALWORKING METHOD KYODO YUSHI CO., LTD. (JP) 2009-10-21 EP disclosed