SCHEMBL31484243

SCHEMBL31484243

CN1c2ccccc2Cc2cc(Cl)ccc21

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 5/20 0.45
DRD4 P21917 4/20 0.45
HRH4 Q9H3N8 1/20 0.45
HSD17B3 P37058 3/20 0.44
OPRK1 P41145 2/20 0.43
LMNA P02545 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
PDE4D Q08499 1/20 0.43
SCN9A Q15858 1/20 0.41
ALDH1A1 P00352 1/20 0.41
MEN1 O00255 2/20 0.40
TP53 P04637 2/20 0.40
CYP3A4 P08684 2/20 0.40
KMT2A Q03164 2/20 0.40
ADRA2A P08913 2/20 0.40
ADRA2B P18089 2/20 0.40
ADRA2C P18825 2/20 0.40
SLC6A2 P23975 2/20 0.40
HTR2A P28223 2/20 0.40
HTR2C P28335 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28691181 1.00 DRD2 (0.45) DRD2DRD4HRH4HSD17B3OPRK1
Bromide SCHEMBL27751559 0.84 MAOA (0.50) DRD2DRD4OPRK1LMNASMN1; SMN2
SCHEMBL12723261 0.83 MAOA (0.45) DRD2DRD4OPRK1LMNASMN1; SMN2
SCHEMBL975897 0.82 MAOA (0.52) DRD2DRD4OPRK1LMNASMN1; SMN2
SCHEMBL29351597 0.82 MAOA (0.52) DRD2DRD4OPRK1LMNASMN1; SMN2
SCHEMBL28232463 0.82 ADRA2A (0.48) DRD2DRD4HSD17B3OPRK1LMNA
Iodide SCHEMBL11862710 0.80 MAOA (0.50) DRD2DRD4OPRK1LMNASMN1; SMN2
SCHEMBL29735917 0.80 MAOA (0.50) DRD2DRD4OPRK1LMNASMN1; SMN2
SCHEMBL14770541 0.80 PDE5A (0.44) DRD2DRD4HSD17B3OPRK1LMNA
SCHEMBL17498249 0.80 DRD2 (0.52) DRD2DRD4OPRK1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119432382-A Polysilicon etching solution 湖北兴福电子材料股份有限公司 2025-02-14 CN claimed
CN-119432382-A Polysilicon etching solution 湖北兴福电子材料股份有限公司 2025-02-14 CN disclosed