SCHEMBL31572011

SCHEMBL31572011

CN(N)c1ccc(O)c(O)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 7/20 0.55
RECQL P46063 6/20 0.55
KDM4E B2RXH2 6/20 0.55
ALOX15 P16050 4/20 0.55
HSD17B10 Q99714 4/20 0.55
ALDH1A1 P00352 3/20 0.55
APEX1 P27695 3/20 0.55
HIF1A Q16665 3/20 0.55
HPGD P15428 2/20 0.55
POLB P06746 2/20 0.55
NFKB1 P19838 2/20 0.55
BLM P54132 2/20 0.55
KMT2A Q03164 2/20 0.55
MAPK1 P28482 2/20 0.55
MEN1 O00255 1/20 0.55
RGS12 O14924 1/20 0.55
USP2 O75604 1/20 0.55
THRB P10828 1/20 0.55
PKM P14618 1/20 0.55
BRCA1 P38398 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25540950 0.80 ALDH1A1 (0.59) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL22046595 0.76 RECQL (0.46) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL9674286 0.74 KDM4E (0.48) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL9148694 0.73 GPR35 (0.53) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL11432864 0.73 ALDH1A1 (0.52) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL11421314 0.73 KDM4E (0.52) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL20310395 0.72 CA12 (0.48) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL3894012 0.71 ALDH1A1 (1.00) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL11793624 0.71 SMN1; SMN2 (0.55) TDP1RECQLKDM4EALOX15HSD17B10
SCHEMBL11437862 0.71 KDM4E (0.50) TDP1RECQLKDM4EALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119937247-A Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2025-05-06 CN disclosed