SCHEMBL3158644

SCHEMBL3158644

C=C(C)C(=O)OC1COC(=O)C1CC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.38
GPX4 P36969 1/20 0.33
KDM4E B2RXH2 3/20 0.33
MAPT P10636 2/20 0.33
ATM Q13315 2/20 0.33
NPC1 O15118 1/20 0.33
POLB P06746 1/20 0.33
PKM P14618 1/20 0.33
HTT P42858 1/20 0.33
RECQL P46063 1/20 0.33
RAB9A P51151 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
LMNA P02545 3/20 0.33
CYP3A4 P08684 3/20 0.33
CHRM4 P08173 2/20 0.33
CHRM5 P08912 2/20 0.33
CHRM1 P11229 2/20 0.33
CYP2C9 P11712 2/20 0.33
CHRM3 P20309 2/20 0.33
KMT2A Q03164 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3154291 0.80 ATM (0.39) ALDH1A1GPX4KDM4EMAPTATM
SCHEMBL713143 0.80 ALDH1A1 (0.38) ALDH1A1GPX4KDM4EMAPTATM
SCHEMBL3149864 0.78 ALDH1A1 (0.40) ALDH1A1GPX4KDM4EMAPTATM
SCHEMBL3167759 0.78 GPX4 (0.37) ALDH1A1GPX4KDM4EMAPTATM
SCHEMBL3158417 0.77 ALDH1A1 (0.36) ALDH1A1GPX4KDM4EMAPTATM
SCHEMBL3159004 0.77 ALDH1A1 (0.39) ALDH1A1KDM4EMAPTLMNACYP3A4
SCHEMBL3149373 0.76 ALDH1A1 (0.37) ALDH1A1GPX4KDM4EMAPTATM
SCHEMBL3154773 0.76 ALDH1A1 (0.37) ALDH1A1GPX4KDM4EMAPTATM
SCHEMBL3159034 0.74 TSHR (0.42) ALDH1A1KDM4EPOLBHTTTDP1
SCHEMBL3167753 0.74 ADORA2B (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1164434-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-10-06 EP disclosed
EP-1225480-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-03-17 EP disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-7144675-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-12-05 US disclosed
US-6964840-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-11-15 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6838225-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-01-04 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed
US-20040048192-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-03-11 US disclosed
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20020132181-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-09-19 US disclosed
EP-1225480-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-07-24 EP disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
US-20020009668-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-24 US disclosed
EP-1164434-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed