⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3175266 | 0.78 | — | — | |
| SCHEMBL395315 | 0.78 | — | — | |
| SCHEMBL5701994 | 0.76 | TSHR (0.37) | — | |
| SCHEMBL5701615 | 0.76 | TSHR (0.37) | — | |
| SCHEMBL3476340 | 0.74 | TSHR (0.49) | — | |
| SCHEMBL5702115 | 0.73 | — | — | |
| SCHEMBL5701498 | 0.73 | — | — | |
| SCHEMBL723097 | 0.72 | LMNA (0.34) | — | |
| SCHEMBL395316 | 0.72 | TSHR (0.46) | — | |
| SCHEMBL3175274 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8367771-B2 | Composition for producing organic insulator comprising an organic-inorganic metal hybrid material | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| US-20090230388-A1 | Composition for producing organic insulator comprising an organic-inorganic metal hybrid material | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-09-17 | — | — | US | claimed |
| US-20060041096-A1 | Organic-inorganic metal hybrid material and composition for producing organic insulator comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-02-23 | — | — | US | claimed |
| US-8367771-B2 | Composition for producing organic insulator comprising an organic-inorganic metal hybrid material | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-05 | — | — | US | disclosed |
| US-7645556-B2 | Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-01-12 | — | — | US | disclosed |
| US-20090230388-A1 | Composition for producing organic insulator comprising an organic-inorganic metal hybrid material | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-09-17 | — | — | US | disclosed |
| US-7560580-B2 | Organic-inorganic metal hybrid material and composition for producing organic insulator comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-14 | — | — | US | disclosed |
| US-20060041096-A1 | Organic-inorganic metal hybrid material and composition for producing organic insulator comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-02-23 | — | — | US | disclosed |
| US-20060006380-A1 | Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-01-12 | — | — | US | disclosed |
| US-20050279995-A1 | Composition for preparing organic insulating film and organic insulating film prepared from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-12-22 | — | — | US | disclosed |