SCHEMBL3182124

SCHEMBL3182124

CCCc1ccc([S+](c2ccccc2)c2ccccc2)c(C)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SKP2 Q13309 1/20 0.38
CNR2 P34972 2/20 0.37
CNR1 P21554 1/20 0.37
FFAR4 Q5NUL3 2/20 0.35
METAP2 P50579 1/20 0.33
PDK2 Q15119 1/20 0.33
KIF11 P52732 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
PSMB5 P28074 1/20 0.32
SIGMAR1 Q99720 1/20 0.32
MGLL Q99685 1/20 0.31
SORT1 Q99523 1/20 0.31
LPL P06858 1/20 0.31
LIPG Q9Y5X9 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
CYP4Z1 Q86W10 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3190351 0.90 SKP2 (0.50) SKP2CNR2METAP2L3MBTL1PSMB5
SCHEMBL3202996 0.88 SKP2 (0.44) SKP2LPLLIPGCYP3A4
SCHEMBL3203203 0.88 SKP2 (0.44) SKP2LPLLIPGCYP3A4
SCHEMBL3190507 0.88 SKP2 (0.44) SKP2LPLLIPGCYP3A4
SCHEMBL3181999 0.83 CNR1 (0.37) CNR2CNR1METAP2PDK2KIF11
SCHEMBL12399375 0.76 L3MBTL1 (0.43) CNR2CNR1L3MBTL1SIGMAR1MGLL
SCHEMBL424810 0.74 CYP2A6 (0.37) L3MBTL1CYP1A2
SCHEMBL3189054 0.74 GPR3 (0.39) SKP2METAP2L3MBTL1PSMB5
SCHEMBL3192234 0.73 DRD2 (0.41) PDK2L3MBTL1
SCHEMBL3206783 0.73 LTA4H (0.47) CYP1A2CYP2D6CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed