SCHEMBL3185485

SCHEMBL3185485

CC(C)=CC(C)=C[Ru]C1=C(C)CC=C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2419716 0.66
SCHEMBL3239560 0.66
SCHEMBL3239196 0.64
SCHEMBL3239198 0.64
SCHEMBL1742221 0.59
SCHEMBL3344391 0.59
SCHEMBL19181271 0.58
SCHEMBL1450176 0.57
SCHEMBL1168637 0.57
SCHEMBL2006423 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2520690-B1 RUTHENIUM COMPLEX MIXTURE, METHOD FOR PRODUCING SAME, COMPOSITION FOR FORMING FILM AND METHOD FOR PRODUCING A RUTHENIUM-CONTAINING FILM TOSOH CORP (JP) 2018-04-11 EP disclosed
US-8742153-B2 Ruthenium complex mixture, method of producing the same, composition for film formation, ruthenium-containing film, and method of producing the same TOSOH CORPORATION (JP) 2014-06-03 US disclosed
EP-2520690-A1 RUTHENIUM COMPLEX MIXTURE, METHOD FOR PRODUCING SAME, COMPOSITION FOR FORMING FILM, RUTHENIUM-CONTAINING FILM AND METHOD FOR PRODUCING SAME Tosoh Corporation (JP) 2012-11-07 EP disclosed
US-20120227625-A1 RUTHENIUM COMPLEX MIXTURE, METHOD OF PRODUCING THE SAME, COMPOSITION FOR FILM FORMATION, RUTHENIUM-CONTAINING FILM, AND METHOD OF PRODUCING THE SAME TOSOH CORPORATION (JP) 2012-09-13 US disclosed
US-7667065-B2 High nucleation density organometallic compounds PRAXAIR TECHNOLOGY, INC. (US) 2010-02-23 US disclosed
US-20080032503-A1 High nucleation density organometallic compounds PRAXAIR TECHNOLOGY, INC. 2008-02-07 US disclosed
WO-2005103318-A1 HIGH NUCLEATION DENSITY ORGANOMETALLIC COMPOUNDS PRAXAIR TECHNOLOGY, INC. (US) 2005-11-03 WO disclosed