SCHEMBL3192187

SCHEMBL3192187

CCCCCCCCCCCCc1ccccc1S(=O)(=O)[O-].CCc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.40
CA2 P00918 1/20 0.36
KCNH2 Q12809 7/20 0.36
SLC16A3 O15427 1/20 0.35
BID P55957 3/20 0.35
MCL1 Q07820 3/20 0.35
BCL2L1 Q07817 2/20 0.35
BAK1 Q16611 2/20 0.35
KAT8 Q9H7Z6 2/20 0.35
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35
EP300 Q09472 1/20 0.35
KAT2A Q92830 1/20 0.35
KAT2B Q92831 1/20 0.35
KAT5 Q92993 1/20 0.35
SAE1 Q9UBE0 1/20 0.35
LMNA P02545 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
TSHR P16473 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL452373 0.93 LIPG (0.45) LIPGKCNH2BIDMCL1BCL2L1
SCHEMBL3188960 0.89 LIPG (0.40) LIPGKCNH2BIDMCL1BCL2L1
SCHEMBL2896010 0.88 LIPG (0.43) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL450362 0.87 LIPG (0.39) LIPGKCNH2BIDMCL1BCL2L1
SCHEMBL3199660 0.86 NR1I2 (0.38) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL3190576 0.86 MMP2 (0.41) LIPGCA2PPARGPPARA
SCHEMBL2901078 0.86 LIPG (0.38) LIPGBIDMCL1BCL2L1BAK1
SCHEMBL5443786 0.84 LIPG (0.40) LIPGKCNH2BIDMCL1BCL2L1
SCHEMBL2895614 0.84 LIPG (0.36) LIPGKCNH2BIDMCL1BCL2L1
SCHEMBL452882 0.83 MMP2 (0.40) LIPGCA2PPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed