Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.45 |
| ▸ | BID | P55957 | 3/20 | 0.40 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.40 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.40 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.40 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.40 |
| ▸ | PPARG | P37231 | 2/20 | 0.40 |
| ▸ | PPARA | Q07869 | 2/20 | 0.40 |
| ▸ | EP300 | Q09472 | 1/20 | 0.40 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.40 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.40 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.40 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.40 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.39 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.39 |
| ▸ | CYSLTR2 | Q9NS75 | 4/20 | 0.39 |
| ▸ | CYSLTR1 | Q9Y271 | 4/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 4/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3188960 | 0.94 | LIPG (0.40) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL3192187 | 0.93 | LIPG (0.40) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL2896010 | 0.93 | LIPG (0.43) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL450362 | 0.92 | LIPG (0.39) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL3190576 | 0.91 | MMP2 (0.41) | LIPGPPARGPPARA | |
| SCHEMBL2901078 | 0.91 | LIPG (0.38) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL16895142 | 0.90 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| Potassium Ion SCHEMBL23749193 | 0.88 | LIPG (0.53) | LIPGBIDMCL1BCL2L1BAK1 | |
| Lithium Ion SCHEMBL21822098 | 0.88 | LIPG (0.53) | LIPGBIDMCL1BCL2L1BAK1 | |
| Lithium Ion SCHEMBL21822091 | 0.88 | LIPG (0.53) | LIPGBIDMCL1BCL2L1BAK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 186 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6200480-B1 | CONTACTING IMPURE SOLUTION OF PHOTOACID GENERATING COMPOUND CONTAINING TRACE AMOUNTS OF ACIDIC IMPURITIES WITH ANIONIC ION EXCHANGE RESIN CONTAINING PENDENT POLYAMINE FUNCTIONAL GROUPS FOR SUFFICIENT AMOUNT OF TIME TO REMOVE SAID IMPURITIES | ARCH SPECIALTY CHEMICALS, INC. | 2001-03-13 | — | — | US | claimed |
| EP-1054715-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | Olin Microelectronic Chemicals, Inc. (US) | 2000-11-29 | — | — | EP | claimed |
| WO-1999036151-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-07-22 | — | — | WO | claimed |
| CN-120077771-A | Curable composition for organic EL element, cured product for organic EL element, method for producing cured product for organic EL element, and polymer | JSR株式会社 | 2025-05-30 | — | — | CN | disclosed |
| WO-2024101411-A1 | CURABLE COMPOSITION FOR ORGANIC EL ELEMENTS, CURED PRODUCT FOR ORGANIC EL ELEMENTS AND METHOD FOR PRODUCING SAME, ORGANIC EL ELEMENT, AND POLYMER | JSR株式会社 | 2024-05-16 | — | — | WO | disclosed |
| US-11970557-B2 | Polymer containing photoacid generator | LG CHEM, LTD. (KR) | 2024-04-30 | — | — | US | disclosed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-11592605-B2 | Color developing structure having concave-convex layer, method for producing such structure, and display | TOPPAN PRINTING CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| CN-114975098-A | Nanoimprint liquid material, method for producing pattern of cured product, and method for producing circuit board | 佳能株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-107251193-B | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2022-06-21 | — | — | CN | disclosed |
| EP-1054715-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | Olin Microelectronic Chemicals, Inc. (US) | 2000-11-29 | — | — | EP | disclosed |
| US-6136500-A | CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION | JSR CORPORATION (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
| US-6037098-A | AROMATIC SULFONIC ACID GENERATED FROM A SULFONIUM COMPOUND TO ENHANCE RESIN ALKALINE SOLUBILITY; REDUCED DIFFUSIBILITY OF ACID IN FILM, I.E., UNIFORM LINE WIDTH; HIGH PHOTOSENSITIVITY AND PHOTODECOMPOSITION EFFICIENCY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-03-14 | — | — | US | disclosed |
| WO-1999036151-A1 | METHOD OF PURIFYING PHOTOACID GENERATORS FOR USE IN PHOTORESIST COMPOSITIONS | OLIN MICROELECTRONIC CHEMICALS, INC. (US) | 1999-07-22 | — | — | WO | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0869393-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-10-07 | — | — | EP | disclosed |
| EP-0795786-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-09-17 | — | — | EP | disclosed |