Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.39 |
| ▸ | STS | P08842 | 2/20 | 0.35 |
| ▸ | KCNH2 | Q12809 | 6/20 | 0.35 |
| ▸ | BID | P55957 | 3/20 | 0.34 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.34 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.34 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.34 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.34 |
| ▸ | PPARG | P37231 | 1/20 | 0.34 |
| ▸ | PPARA | Q07869 | 1/20 | 0.34 |
| ▸ | EP300 | Q09472 | 1/20 | 0.34 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.34 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.34 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.34 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.34 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5443786 | 0.98 | LIPG (0.40) | LIPGSTSKCNH2BIDMCL1 | |
| SCHEMBL452373 | 0.92 | LIPG (0.45) | LIPGKCNH2BIDMCL1BCL2L1 | |
| SCHEMBL3188960 | 0.88 | LIPG (0.40) | LIPGKCNH2BIDMCL1BCL2L1 | |
| SCHEMBL3192187 | 0.87 | LIPG (0.40) | LIPGKCNH2BIDMCL1BCL2L1 | |
| SCHEMBL2896010 | 0.87 | LIPG (0.43) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL2895614 | 0.85 | LIPG (0.36) | LIPGKCNH2BIDMCL1BCL2L1 | |
| SCHEMBL2901078 | 0.85 | LIPG (0.38) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL3190576 | 0.85 | MMP2 (0.41) | LIPGPPARGPPARA | |
| SCHEMBL3199660 | 0.85 | NR1I2 (0.38) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL6761947 | 0.84 | LIPG (0.39) | LIPGBIDMCL1BCL2L1BAK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11249398-B2 | Method for producing plated shaped structure and photosensitive resin composition for production of plated shaped structures | JSR CORPORATION (JP) | 2022-02-15 | — | — | US | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2758987-B1 | METHOD OF FORMING A FILM | CANON KK (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-10208183-B2 | Curable composition, film, and method of producing film | CANON KABUSHIKI KAISHA (JP) | 2019-02-19 | — | — | US | disclosed |
| US-9982102-B2 | Photocurable composition and method of manufacturing film using the composition | CANON KABUSHIKI KAISHA (JP) | 2018-05-29 | — | — | US | disclosed |
| US-9961776-B2 | Method of producing cured product and method of forming pattern | CANON KABUSHIKI KAISHA (JP) | 2018-05-01 | — | — | US | disclosed |
| EP-2847235-B1 | PHOTOCURABLE COMPOSITION AND METHOD OF MANUFACTURING FILM USING THE COMPOSITION | CANON KK (JP) | 2017-11-22 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| US-6403288-B1 | COATING WITH COPOLYMER COMPRISING HYDROXYSTYRENE DERIVATIVE MONOMER HAVING ACID DISSOCIABLE GROUP; EXPOSURE TO RADIATION; DEVELOPMENT | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | LIPG 777/4885STS 2869/4885KCNH2 1172/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.