Acetic Acid

Acetic Acid

SCHEMBL319665

CC(=O)[O-].CC(C)[N+](C)(C)O

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.50
BBOX1 O75936 2/20 0.39
CA4 P22748 2/20 0.37
SLC22A16 Q86VW1 1/20 0.33
CA2 P00918 1/20 0.33
TSHR P16473 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
CHRM1 P11229 1/20 0.32
TBXA2R P21731 1/20 0.32
MEN1 O00255 1/20 0.31
CYP1A2 P05177 1/20 0.31
HRH1 P35367 1/20 0.31
KMT2A Q03164 1/20 0.31
CRAT P43155 1/20 0.31
CPT2 P23786 1/20 0.31
CPT1A P50416 1/20 0.31
GALR3 O60755 1/20 0.31
MAPT P10636 1/20 0.31
BLM P54132 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL9501836 0.88 BBOX1 (0.39) CA1BBOX1CA4SLC22A16CA2
L-Lactic Acid SCHEMBL3820376 0.82 TP53 (0.38) CA1BBOX1CA4SLC22A16CA2
SCHEMBL10643640 0.80 BBOX1 (0.35) BBOX1SLC22A16SMN1; SMN2ALDH1A1
SCHEMBL144709 0.79
Acetic Acid SCHEMBL11368283 0.78 CA1 (0.53) CA1BBOX1CA4CA2TSHR
Water SCHEMBL190437 0.75
Fluoride Ion SCHEMBL190899 0.75
SCHEMBL9752218 0.75
Hydrochloric Acid SCHEMBL2439108 0.75
Tetramethylammonium Ion SCHEMBL106975 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113265037-B Polyisocyanate composition and preparation method and application thereof 万华化学(宁波)有限公司 2023-03-24 CN claimed
WO-2022241616-A1 POLYISOCYANATE COMPOSITION, PREPARATION METHOD THEREFOR AND APPLICATION THEREOF 万华化学(宁波)有限公司 2022-11-24 WO claimed
CN-113698572-A Polyisocyanate composition, preparation method and application 万华化学(宁波)有限公司 2021-11-26 CN claimed
CN-113265037-A Polyisocyanate composition and preparation method and application thereof 万华化学(宁波)有限公司 2021-08-17 CN claimed
CN-113698572-A Polyisocyanate composition, preparation method and application 万华化学(宁波)有限公司 2021-11-26 CN disclosed
CN-113265037-A Polyisocyanate composition and preparation method and application thereof 万华化学(宁波)有限公司 2021-08-17 CN disclosed
US-10717880-B2 Polyisocyanate-based anti-corrosion coating HUNTSMAN INTERNATIONAL LLC (US) 2020-07-21 US disclosed
US-10030094-B2 Polyisocyanurate-based syntactic coating for offshore applications HUNTSMAN INTERNATIONAL LLC (US) 2018-07-24 US disclosed
US-9926479-B2 Materials comprising a matrix and process for preparing them HUNTSMAN INTERNATIONAL LLC (US) 2018-03-27 US disclosed
US-9534072-B2 Polyisocyanate-based adhesive HUNTSMAN INTERNATIONAL LLC (US) 2017-01-03 US disclosed
EP-2300509-B1 A POLYISOCYANURATE-BASED SYNTACTIC COATING FOR OFFSHORE APPLICATIONS HUNTSMAN INT LLC (US) 2016-08-10 EP disclosed
EP-2245081-B1 ELASTOMERIC MATERIALS HAVING A HIGH HARDBLOCK CONTENT AND PROCESS FOR PREPARING THEM HUNTSMAN INT LLC (US) 2015-09-16 EP disclosed
EP-1970420-A1 Polyisocyanate-based adhesive composition HUNTSMAN INTERNATIONAL LLC (US) 2008-09-17 EP disclosed
US-20080199814-A1 Device manufacturing process utilizing a double patterning process FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2008-08-21 US disclosed
US-7405258-B2 Method for producing polyurethane emulsion for aqueous one-component coating agent NIPPON POLYURETHANE INDUSTRY CO., LTD. (JP) 2008-07-29 US disclosed
WO-2008070060-A2 DEVICE MANUFACTURING PROCESS UTILIZING A DOUBLE PATTERING PROCESS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-06-12 WO disclosed
US-20070155894-A1 Method for producing polyurethane emulsion for aqueous one-component coating agent NIPPON POLYURETHANE INDUSTRY CO., LTD. 2007-07-05 US disclosed
EP-1721947-A1 PROCESS FOR PRODUCING POLYURETHANE EMULSION FOR WATER-BASED ONE-PACK TYPE COATING MATERIAL Nippon Polyurethane Industry Co., Ltd. (JP) 2006-11-15 EP disclosed
US-6596819-B2 An isocyanate group-terminated prepolymer having isocyanurate group and urethane group, obtained by reacting an organic polyisocyanate containing at least (a1) an aromatic diisocyanate with an active hydrogen group-containing compound NIPPON POLYURETHANE INDUSTRY CO., LTD. (JP) 2003-07-22 US disclosed
US-20030083451-A1 Polyisocyanate curing agent for laminate adhesive and process for production thereof NIPPON POLYURETHANE INDUSTRY CO., LTD. (JP) 2003-05-01 US disclosed