SCHEMBL32009

SCHEMBL32009

C=C(c1ccccc1)C(F)(F)F

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 4/20 0.52
TSHR P16473 3/20 0.38
ALDH1A1 P00352 2/20 0.38
CES2 O00748 2/20 0.38
DAO P14920 1/20 0.38
NAPRT Q6XQN6 1/20 0.38
MAOA P21397 2/20 0.37
MAOB P27338 2/20 0.37
AKT1 P31749 1/20 0.36
MAPT P10636 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
LMNA P02545 1/20 0.35
XBP1 P17861 1/20 0.35
ATM Q13315 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
F2 P00734 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL28792690 0.97 CES1 (0.50) CES1TSHRALDH1A1CES2DAO
SCHEMBL20973149 0.86 KIF11 (0.46) CES1ALDH1A1MAPTLMNAATM
Ether SCHEMBL28740534 0.84 ALDH1A1 (0.41) CES1ALDH1A1MAPTMEN1KMT2A
SCHEMBL28877314 0.82 CES1 (0.44) CES1TSHRALDH1A1CES2DAO
SCHEMBL28013821 0.82 CES1 (0.39) CES1CES2MAPTATMTDP1
SCHEMBL28641168 0.81 PARP10 (0.48) TSHRMAOAMEN1KMT2ASMN1; SMN2
Methylphenylsulfone SCHEMBL28582496 0.81 PTGS2 (0.47) CES1
SCHEMBL22157975 0.80 CES1 (0.43) CES1TSHRALDH1A1DAONAPRT
SCHEMBL29056467 0.80 CES1 (0.43) CES1TSHRALDH1A1CES2DAO
SCHEMBL9414658 0.78 TSHR (0.55) CES1TSHRALDH1A1CES2DAO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 481 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116924897-B Method for preparing gamma, gamma-gem difluoroallylketone compound 中国科学院大连化学物理研究所 2025-04-18 CN claimed
CN-117510291-A Preparation method of acrylamide compound 昆明理工大学 2024-02-06 CN claimed
CN-117486920-A Gem difluoro allyl silicon compound and synthesis method thereof 云南铁峰矿业化工新技术有限公司 2024-02-02 CN claimed
CN-117430544-A Method for preparing isoindoline compound by taking alpha-amino acetal as substrate 南京工业大学 2024-01-23 CN claimed
CN-116924897-A Method for preparing gamma, gamma-gem difluoroallylketone compound 中国科学院大连化学物理研究所 2023-10-24 CN claimed
CN-110642748-B O- (2-trifluoromethyl-2-hydroxyethyl) oxime ether derivative and synthetic method and application thereof 华南理工大学 2023-03-31 CN claimed
CN-115403482-A Method for obtaining beta-amino acid ester/beta-amino ketone derivative through alkene-based free radical alkoxycarbonylation/carbonylation reaction 广西师范大学 2022-11-29 CN claimed
CN-112794782-B Fluorine-containing carboxylic acid compound and preparation method thereof 四川大学 2022-06-17 CN claimed
CN-109651191-B Difluoromethyl oxime ether derivative and synthetic method thereof 华南理工大学 2021-11-19 CN claimed
CN-113024349-A 3, 3-difluoro-1, 5-hexadiene compound and preparation method and application thereof 南京工业大学 2021-06-25 CN claimed
US-7132219-B2 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition BREWER SCIENCE INC. (US) 2006-11-07 US claimed
EP-1397260-A4 POLYMERIC ANTIREFLECTIVE COATINGS DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION BREWER SCIENCE INC (US) 2006-03-08 EP claimed
EP-1397260-A1 POLYMERIC ANTIREFLECTIVE COATINGS DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Brewer Science, Inc. (US) 2004-03-17 EP claimed
CN-1474752-A Polymer anti-reflective coatings deposited by plasma enhanced chemical vapor deposition ��³�߼�����ѧ 2004-02-11 CN claimed
US-20030219541-A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition BREWER SCIENCE, INC. 2003-11-27 US claimed
US-6610456-B2 Such as 4-(hexafluorohydroxyisopropyl)styrene copolymer with tert-butyl alpha-trifluoromethyl acrylate; transparent to deep ultraviolet (DUV) radiation INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-08-26 US claimed
US-20030064608-A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition SABNIS RAM W (US) 2003-04-03 US claimed
US-20030054117-A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition BREWER SCIENCE, INC. 2003-03-20 US claimed
US-20020164538-A1 Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-11-07 US claimed
WO-2002062593-A1 POLYMERIC ANTIREFLECTIVE COATINGS DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION BREWER SCIENCE, INC. (US) 2002-08-15 WO claimed