SCHEMBL3201024

SCHEMBL3201024

COc1ccc([S+](c2ccccc2)c2ccccc2)c(C)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.47
CYP1A2 P05177 2/20 0.42
CYP2A6 P11509 1/20 0.42
CA4 P22748 1/20 0.40
LTA4H P09960 2/20 0.39
ACHE P22303 1/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
LMNA P02545 2/20 0.38
RAB9A P51151 2/20 0.38
KDM4E B2RXH2 1/20 0.38
NPC1 O15118 1/20 0.38
ALDH1A1 P00352 1/20 0.38
POLB P06746 1/20 0.38
NQO2 P16083 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TSHR P16473 1/20 0.37
HTT P42858 1/20 0.37
KDM1A O60341 1/20 0.37
MAOA P21397 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3193543 0.86 GAA (0.44) GAACYP1A2CYP2A6CA4LTA4H
SCHEMBL3206458 0.82 HPGD (0.49) GAACYP1A2CYP2A6MEN1KMT2A
SCHEMBL3203674 0.82 CA12 (0.48) GAACYP1A2CYP2A6CA4LTA4H
SCHEMBL3195400 0.81 ALDH1A1 (0.40) GAAMEN1KMT2ALMNARAB9A
SCHEMBL3189956 0.81 KIF11 (0.40) GAA
SCHEMBL3192234 0.79 DRD2 (0.41) LTA4HMEN1KMT2APOLBL3MBTL1
SCHEMBL3206783 0.79 LTA4H (0.47) CYP1A2LTA4HTSHR
SCHEMBL3203135 0.79 CA12 (0.48) CYP1A2CYP2A6CA4MEN1KMT2A
SCHEMBL3197728 0.77 MEN1 (0.44) GAACYP1A2CYP2A6CA4MEN1
SCHEMBL424810 0.77 CYP2A6 (0.37) CYP1A2CYP2A6ACHELMNARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed