SCHEMBL3201792

SCHEMBL3201792

O=[N+]([O-])c1cc(S(=O)(=O)O)ccc1S(=O)(=O)O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.58
HPGD P15428 2/20 0.58
TDP1 Q9NUW8 1/20 0.58
CASP6 P55212 2/20 0.54
GAA P10253 2/20 0.54
NSD2 O96028 1/20 0.54
PLCG1 P19174 1/20 0.54
DNMT1 P26358 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
CA12 O43570 4/20 0.49
CA1 P00915 4/20 0.49
CA2 P00918 4/20 0.49
CA9 Q16790 4/20 0.49
VCAM1 P19320 4/20 0.46
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
KIF18A Q8NI77 1/20 0.45
KDM4E B2RXH2 1/20 0.44
HTT P42858 1/20 0.44
CYP2C9 P11712 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3660349 0.85 KMT2A (0.61) ALDH1A1HPGDTDP1GAACA12
SCHEMBL9163223 0.85 ALDH1A1 (0.54) ALDH1A1HPGDTDP1CASP6GAA
SCHEMBL29535309 0.85 ALDH1A1 (0.54) ALDH1A1HPGDTDP1CASP6GAA
SCHEMBL392626 0.84 HPGD (0.62) ALDH1A1HPGDTDP1CASP6GAA
SCHEMBL10384841 0.83 KIF18A (0.68) ALDH1A1HPGDTDP1CASP6GAA
SCHEMBL1363964 0.83 KMT2A (0.59) ALDH1A1HPGDTDP1MEN1KMT2A
SCHEMBL3182608 0.83 ALDH1A1 (0.45) ALDH1A1HPGDTDP1CASP6GAA
SCHEMBL63183 0.83 KMT2A (0.59) ALDH1A1HPGDTDP1MEN1KMT2A
SCHEMBL9742841 0.82 L3MBTL1 (0.53) ALDH1A1HPGDTDP1CASP6GAA
SCHEMBL11442799 0.82 KIF18A (0.51) ALDH1A1HPGDTDP1CASP6GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6767481-B2 AT LEAST ONE REDUCIBLE AND AT LEAST ONE OXIDIZABLE SUBSTANCE OX2 AND RED1, RESPECTIVELY, WHICH ARE LINKED TO ONE ANOTHER VIA A BRIDGE BAYER AKTIENGESELLSCHAFT (DE) 2004-07-27 US claimed
US-20020197486-A1 Electrochromic system with coupled RED-OX system and special anions BERNETH HORST (DE) 2002-12-26 US claimed
US-6417951-B1 ELECTROLYTIC CELLS BAYER AKTIENGESELLSCHAFT (DE) 2002-07-09 US claimed
CN-116779048-B Modeling method and modeling system for benzene nitration runaway mechanism model 中国石油化工股份有限公司 2025-06-24 CN disclosed
CN-116779048-A Modeling method and modeling system for benzene nitration runaway mechanism model 中国石油化工股份有限公司 2023-09-19 CN disclosed
CN-116779047-A Benzene nitration reaction out-of-control identification method, identification system and out-of-control inhibition method 中国石油化工股份有限公司 2023-09-19 CN disclosed
US-7678702-B2 CMP composition of boron surface-modified abrasive and nitro-substituted sulfonic acid and method of use AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-03-16 US disclosed
US-7247566-B2 CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers DUPONT AIR PRODUCTS NANOMATERIALS LLC (US) 2007-07-24 US disclosed
US-20070054495-A1 CMP composition of boron surface-modified abrasive and nitro-substituted sulfonic acid and method of use VERSUM MATERIALS US, LLC 2007-03-08 US disclosed
US-20050090109-A1 CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers VERSUM MATERIALS US, LLC 2005-04-28 US disclosed
US-6767481-B2 AT LEAST ONE REDUCIBLE AND AT LEAST ONE OXIDIZABLE SUBSTANCE OX2 AND RED1, RESPECTIVELY, WHICH ARE LINKED TO ONE ANOTHER VIA A BRIDGE BAYER AKTIENGESELLSCHAFT (DE) 2004-07-27 US disclosed
US-20020197486-A1 Electrochromic system with coupled RED-OX system and special anions BERNETH HORST (DE) 2002-12-26 US disclosed
US-6417951-B1 ELECTROLYTIC CELLS BAYER AKTIENGESELLSCHAFT (DE) 2002-07-09 US disclosed
US-5315036-A Process for the preparation of 2-aminobenzene-1,4-disulphonic acids and the new compound 6-chloro-2-aminobenzene-1,4-disulphonic acid BAYER AKTIENGESELLSCHAFT (DE) 1994-05-24 US disclosed
US-4355141-A NITROGEN-COMPOUND CONTAINING RESOLE RESIN PREVENTS STICKING MITSUI TOATSU CHEMICAL, INC. (JP) 1982-10-19 US disclosed