Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | THRA | P10827 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | LSS | P48449 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | APAF1 | O14727 | 1/20 | 0.31 |
| ▸ | RAD52 | P43351 | 1/20 | 0.31 |
| ▸ | CASP7 | P55210 | 1/20 | 0.31 |
| ▸ | CASP6 | P55212 | 1/20 | 0.31 |
| ▸ | CASP8 | Q14790 | 1/20 | 0.31 |
| ▸ | ARG1 | P05089 | 1/20 | 0.30 |
| ▸ | ARG2 | P78540 | 1/20 | 0.30 |
| ▸ | MLYCD | O95822 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL1131532 | 0.86 | MAPT (0.57) | MAPTKMT2AMEN1L3MBTL1APAF1 | |
| SCHEMBL28696744 | 0.85 | THRB (0.37) | MAPTTHRBLSSMLYCD | |
| Bicarbonate SCHEMBL10946736 | 0.82 | MAPT (0.47) | MAPTKMT2AMEN1THRATHRB | |
| Trolamine SCHEMBL5874602 | 0.80 | ALOX15 (0.38) | MAPTKMT2AMEN1KDM4EARG1 | |
| Acetic Acid SCHEMBL11055551 | 0.79 | MAPT (0.45) | MAPTKMT2AMEN1THRATHRB | |
| SCHEMBL10793105 | 0.77 | TSHR (0.39) | MAPTKMT2AMEN1THRATHRB | |
| Carbamic Acid SCHEMBL9587573 | 0.77 | MAPT (0.43) | MAPTKMT2AMEN1THRATHRB | |
| Acetone SCHEMBL28041802 | 0.76 | MAPT (0.47) | MAPTKMT2AMEN1THRATHRB | |
| SCHEMBL29222973 | 0.76 | MVD (0.42) | MAPTKMT2AMEN1THRATHRB | |
| Trifluoroacetic Acid SCHEMBL11509703 | 0.76 | ALDH1A1 (0.36) | KMT2AMEN1THRBL3MBTL1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150344826-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ENTEGRIS, INC. | 2015-12-03 | — | — | US | claimed |
| US-9109188-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-08-18 | — | — | US | claimed |
| US-20130072411-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-03-21 | — | — | US | claimed |
| US-8293694-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-10-23 | — | — | US | claimed |
| EP-1381656-B1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2010-11-10 | — | — | EP | claimed |
| US-20100035785-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS INC. (US) | 2010-02-11 | — | — | US | claimed |
| US-7605113-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS INC. (US) | 2009-10-20 | — | — | US | claimed |
| EP-1446460-A4 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECH MATERIALS (US) | 2009-08-19 | — | — | EP | claimed |
| US-6896826-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2005-05-24 | — | — | US | claimed |
| EP-1446460-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2004-08-18 | — | — | EP | claimed |
| WO-2003035797-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-01 | — | — | WO | claimed |
| US-20030078173-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ENTEGRIS, INC. | 2003-04-24 | — | — | US | claimed |
| US-20150344826-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ENTEGRIS, INC. | 2015-12-03 | — | — | US | disclosed |
| US-9109188-B2 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-08-18 | — | — | US | disclosed |
| US-8999363-B2 | Methods and compositions for antimicrobial surfaces | SISHIELD TECHNOLOGIES, INC. (US) | 2015-04-07 | — | — | US | disclosed |
| US-8999357-B2 | Methods and compositions for biocidal treatments | SISHIELD TECHNOLOGIES, INC. (US) | 2015-04-07 | — | — | US | disclosed |
| WO-2003035797-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-05-01 | — | — | WO | disclosed |
| US-20030078173-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ENTEGRIS, INC. | 2003-04-24 | — | — | US | disclosed |
| WO-2002077120-A1 | AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-10-03 | — | — | WO | disclosed |
| US-20010050350-A1 | Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate | ADVANCED TECHNOLOGY MATERIALS INC. | 2001-12-13 | — | — | US | disclosed |