SCHEMBL3202401

SCHEMBL3202401

CCc1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=S(=O)([O-])c1ccccc1C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 1/20 0.39
HSD11B1 P28845 2/20 0.38
KMT2A Q03164 3/20 0.38
MEN1 O00255 2/20 0.38
SLC22A12 Q96S37 5/20 0.37
ALDH1A1 P00352 2/20 0.37
PTGDR2 Q9Y5Y4 3/20 0.37
POLB P06746 1/20 0.36
RXFP1 Q9HBX9 1/20 0.36
CYP2C9 P11712 1/20 0.36
SLC22A6 Q4U2R8 1/20 0.36
SLC22A8 Q8TCC7 1/20 0.36
SLC22A11 Q9NSA0 1/20 0.36
TAOK1 Q7L7X3 1/20 0.35
TAOK3 Q9H2K8 1/20 0.35
P2RY4 P51582 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL451959 0.88 KMT2A (0.46) HSD11B1KMT2AMEN1SLC22A12ALDH1A1
SCHEMBL3204977 0.85 SLC22A12 (0.42) FFAR4HSD11B1KMT2AMEN1SLC22A12
SCHEMBL29754085 0.84 HSD11B1 (0.45) FFAR4HSD11B1KMT2AMEN1SLC22A12
SCHEMBL452162 0.84 HSD11B1 (0.45) FFAR4HSD11B1KMT2AMEN1SLC22A12
SCHEMBL2895718 0.83 KMT2A (0.42) FFAR4HSD11B1KMT2AMEN1SLC22A12
Trifluoromethanesulfonic Acid SCHEMBL3190738 0.82 KCNH2 (0.40) ALDH1A1
SCHEMBL3192127 0.82 HSD11B1 (0.38) HSD11B1KMT2AMEN1SLC22A12ALDH1A1
SCHEMBL3183361 0.82 GAA (0.51) FFAR4KMT2AMEN1SLC22A12ALDH1A1
SCHEMBL5422186 0.82 FFAR4 (0.41) FFAR4HSD11B1KMT2AMEN1SLC22A12
SCHEMBL3201028 0.82 BCHE (0.40) HSD11B1KMT2AALDH1A1POLBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed