Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 8/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.39 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.39 |
| ▸ | SLC22A12 | Q96S37 | 6/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | SLC22A6 | Q4U2R8 | 2/20 | 0.38 |
| ▸ | SLC22A8 | Q8TCC7 | 2/20 | 0.38 |
| ▸ | SLC22A11 | Q9NSA0 | 2/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29754085 | 1.00 | HSD11B1 (0.45) | HSD11B1KMT2AMEN1FFAR1FFAR4 | |
| SCHEMBL5445938 | 0.97 | HSD11B1 (0.47) | HSD11B1KMT2AMEN1FFAR1FFAR4 | |
| SCHEMBL3789167 | 0.91 | HSD11B1 (0.45) | HSD11B1KMT2AMEN1FFAR1FFAR4 | |
| SCHEMBL451959 | 0.90 | KMT2A (0.46) | HSD11B1KMT2AMEN1SLC22A12ALDH1A1 | |
| SCHEMBL3204977 | 0.88 | SLC22A12 (0.42) | HSD11B1KMT2AMEN1FFAR1FFAR4 | |
| SCHEMBL2895718 | 0.85 | KMT2A (0.42) | HSD11B1KMT2AMEN1FFAR4SLC22A12 | |
| SCHEMBL3134793 | 0.85 | HSD11B1 (0.42) | HSD11B1ALDH1A1CA1CA2 | |
| SCHEMBL3134860 | 0.85 | HSD11B1 (0.42) | HSD11B1ALDH1A1CA1CA2 | |
| SCHEMBL3192127 | 0.84 | HSD11B1 (0.38) | HSD11B1KMT2AMEN1SLC22A12ALDH1A1 | |
| SCHEMBL3202401 | 0.84 | FFAR4 (0.39) | HSD11B1KMT2AMEN1FFAR4SLC22A12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 286 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100119835-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN INTERNATIONAL LLC (US) | 2010-05-13 | — | — | US | claimed |
| EP-2118197-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | Huntsman Advanced Materials (Switzerland) GmbH (CH) | 2009-11-18 | — | — | EP | claimed |
| WO-2008110512-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) | 2008-09-18 | — | — | WO | claimed |
| WO-2024141543-A1 | TRIARYLSULFONIUM BASED PHOTOINITIATORS FOR LED CURE OF CATIONIC, FREE RADICAL AND HYBRID CATIONIC/FREE RADICAL FORMULATIONS | ARKEMA FRANCE (FR) | 2024-07-04 | — | — | WO | disclosed |
| WO-2024141537-A1 | SULFONIUM SALT PHOTOINITIATORS AND METHODS OF LED CURING A COMPOSITION WITH SAID SULFONIUM SALT PHOTOINITIATORS | ARKEMA FRANCE (FR) | 2024-07-04 | — | — | WO | disclosed |
| WO-2024122572-A1 | WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-20240085784-A1 | ORGANIC EL DISPLAY DEVICE | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2024-03-14 | — | — | US | disclosed |
| US-20230364928-A1 | INKJET INK, METHOD FOR MANUFACTURING PRINTED MATERIAL, AND PRINTED MATERIAL | NATOCO CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230322998-A1 | PHOTO-CURABLE RESIN COMPOSITION FOR USE IN STEREOLITHOGRAPHY | BLUE CUBE IP LLC | 2023-10-12 | — | — | US | disclosed |
| EP-3727797-B1 | A HYBRID PHOTOPOLYMER COMPOSITION FOR ADDITIVE MANUFACTURING | PERSTORP AB (SE) | 2023-09-27 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-6337171-B1 | AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS | JSR CORPORATION (JP) | 2002-01-08 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |