SCHEMBL3201028

SCHEMBL3201028

CCc1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=S(=O)([O-])c1ccc(C(F)(F)F)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.40
ACHE P22303 1/20 0.40
CA2 P00918 2/20 0.38
HSD11B1 P28845 3/20 0.38
CYP19A1 P11511 1/20 0.38
MAPT P10636 2/20 0.38
LMNA P02545 1/20 0.38
CYP1A2 P05177 1/20 0.38
POLB P06746 1/20 0.38
CYP3A4 P08684 1/20 0.38
GAA P10253 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
MAPK1 P28482 1/20 0.38
CYP2C19 P33261 1/20 0.38
HTT P42858 1/20 0.38
AR P10275 1/20 0.38
PTGER1 P34995 1/20 0.37
KEAP1 Q14145 1/20 0.36
NFE2L2 Q16236 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5412451 0.90 L3MBTL1 (0.39) CA2CYP19A1MAPTPOLBCA1
SCHEMBL3132680 0.89 ALDH1A1 (0.43) HSD11B1CYP19A1MAPTLMNAPOLB
SCHEMBL3139768 0.89 ALDH1A1 (0.43) HSD11B1CYP19A1MAPTLMNAPOLB
SCHEMBL6282698 0.88 POLB (0.43) CA2MAPTLMNAPOLBCYP3A4
SCHEMBL3182561 0.87 CA2 (0.46) CA2HSD11B1MAPTLMNAPOLB
SCHEMBL503701 0.87 ALDH1A1 (0.45) HSD11B1CYP19A1MAPTLMNAPOLB
SCHEMBL3201835 0.85 CYP19A1 (0.38) BCHEACHEHSD11B1CYP19A1MAPT
SCHEMBL3136043 0.85 ALDH1A1 (0.46) BCHEACHECA2HSD11B1MAPT
SCHEMBL3134860 0.85 HSD11B1 (0.42) CA2HSD11B1LMNAHTTEEF2K
SCHEMBL3134793 0.85 HSD11B1 (0.42) CA2HSD11B1LMNAHTTEEF2K

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed