Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 4/20 | 0.62 |
| ▸ | RAB9A | P51151 | 4/20 | 0.62 |
| ▸ | TSHR | P16473 | 3/20 | 0.62 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.62 |
| ▸ | RECQL | P46063 | 1/20 | 0.60 |
| ▸ | THRB | P10828 | 1/20 | 0.59 |
| ▸ | MEN1 | O00255 | 3/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.56 |
| ▸ | TP53 | P04637 | 3/20 | 0.55 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.55 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | TGM2 | P21980 | 1/20 | 0.51 |
| ▸ | MGLL | Q99685 | 1/20 | 0.50 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13899382 | 0.95 | NPC1 (0.57) | NPC1RAB9ATSHRSMN1; SMN2RECQL | |
| SCHEMBL13899392 | 0.92 | NPSR1 (0.60) | NPC1RAB9ATSHRSMN1; SMN2RECQL | |
| SCHEMBL13899407 | 0.92 | NPSR1 (0.60) | NPC1RAB9ATSHRSMN1; SMN2RECQL | |
| SCHEMBL11513108 | 0.89 | MGLL (0.52) | NPC1RAB9ATSHRSMN1; SMN2RECQL | |
| SCHEMBL13899225 | 0.89 | NPSR1 (0.60) | NPC1RAB9ATSHRSMN1; SMN2RECQL | |
| SCHEMBL18352644 | 0.87 | NPC1 (0.66) | NPC1RAB9ATSHRSMN1; SMN2RECQL | |
| SCHEMBL13899144 | 0.84 | THRB (0.50) | NPC1RAB9ATSHRSMN1; SMN2RECQL | |
| SCHEMBL10060661 | 0.84 | HPGD (0.58) | NPC1RAB9ATSHRSMN1; SMN2RECQL | |
| Ethyl Phenylcarbamate SCHEMBL6159019 | 0.84 | RAB9A (0.60) | NPC1RAB9ATSHRSMN1; SMN2THRB | |
| SCHEMBL7056940 | 0.84 | TGM2 (0.54) | NPC1RAB9ATSHRSMN1; SMN2RECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4500629-A | Method of forming images from liquid masses | CIBA-GEIGY CORPORATION (US) | 1985-02-19 | — | — | US | claimed |
| US-20210234193-A1 | SOLID ELECTROLYTE COMPOSITION, SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, ALL-SOLID STATE SECONDARY BATTERY, METHOD OF MANUFACTURING SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND METHOD OF MANUFACTURING ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2021-07-29 | — | — | US | disclosed |
| CN-107223121-B | Wet stable holographic media | 科思创德国股份有限公司 | 2020-10-27 | — | — | CN | disclosed |
| US-9366957-B2 | Photopolymer formulation having triazine-based writing monomers | COVESTRO DEUTSCHLAND AG (DE) | 2016-06-14 | — | — | US | disclosed |
| US-9057950-B2 | Photopolymer formulation having ester-based writing monomers | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2015-06-16 | — | — | US | disclosed |
| US-20120321998-A1 | PHOTOPOLYMER FORMULATION HAVING TRIAZINE-BASED WRITING MONOMERS | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2012-12-20 | — | — | US | disclosed |
| US-20120302659-A1 | PHOTOPOLYMER FORMULATION HAVING ESTER-BASED WRITING MONOMERS | COVESTRO DEUTSCHLAND AG (DE) | 2012-11-29 | — | — | US | disclosed |
| US-8222314-B2 | Phenyl isocyanate-based urethane acrylates, processes for producing and methods of using the same | BAYER MATERIALSCIENCE AG (DE) | 2012-07-17 | — | — | US | disclosed |
| US-7825168-B2 | Ink composition, ink jet recording method, method of producing planographic printing plate, and planographic printing plate | FUJIFILM CORPORATION (JP) | 2010-11-02 | — | — | US | disclosed |
| US-7825168-B2 | Ink composition, ink jet recording method, method of producing planographic printing plate, and planographic printing plate | FUJIFILM CORPORATION (JP) | 2010-11-02 | — | — | US | disclosed |
| US-20070060665-A1 | polymerization initiator and a monofunctional (meth)acrylate having a CONH bond in the molecule; acrylate monomer having an amide or carbamate or urea in the side chain; hydrogen bonding increases curing speed and flexibility of film | FUJI PHOTO FILM CO., LTD. | 2007-03-15 | — | — | US | disclosed |
| US-20070060665-A1 | polymerization initiator and a monofunctional (meth)acrylate having a CONH bond in the molecule; acrylate monomer having an amide or carbamate or urea in the side chain; hydrogen bonding increases curing speed and flexibility of film | FUJI PHOTO FILM CO., LTD. | 2007-03-15 | — | — | US | disclosed |
| US-6258441-B1 | PHOTOPOLYMERIZATION; ACRYLATED POLYURETHANE | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 2001-07-10 | — | — | US | disclosed |
| EP-0730615-B1 | LOW-ODOUR ADHESIVE COMPOSITION COMPRISING URETHANE GROUP CONTAINING (METH)ACRYLATE | HENKEL KGAA (DE) | 2000-09-06 | — | — | EP | disclosed |
| US-5700891-A | CONTAINS ACTIVATOR SYSTEM FOR FREE-RADICAL POLYMERIZATION | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 1997-12-23 | — | — | US | disclosed |
| EP-0730615-A1 | LOW-ODOUR ADHESIVE COMPOSITION COMPRISING URETHANE GROUP CONTAINING (METH)ACRYLATE | Henkel Kommanditgesellschaft auf Aktien (DE) | 1996-09-11 | — | — | EP | disclosed |
| EP-0429668-B1 | SOFT COATED FILM | DAINIPPON PRINTING CO LTD (JP) | 1995-12-13 | — | — | EP | disclosed |
| WO-1995014725-A1 | LOW-ODOUR ADHESIVE COMPOSITION COMPRISING URETHANE GROUP CONTAINING (METH)ACRYLATE | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 1995-06-01 | — | — | WO | disclosed |
| US-5401348-A | Wear and imapct resistant | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1995-03-28 | — | — | US | disclosed |
| EP-0429668-A1 | SOFT COATED FILM | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1991-06-05 | — | — | EP | disclosed |