SCHEMBL3204518

SCHEMBL3204518

CCCCN(CCCC)c1ccc(C(c2ccc(NCCCC#N)cc2)c2ccc(N(CCCC)CCCC)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.39
CNR2 P34972 3/20 0.39
ALDH1A1 P00352 1/20 0.38
SLC16A3 O15427 2/20 0.35
SLC16A1 P53985 2/20 0.35
HTT P42858 1/20 0.35
LMNA P02545 3/20 0.33
TP53 P04637 1/20 0.33
MAPT P10636 1/20 0.33
ALOX15 P16050 1/20 0.33
GFER P55789 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CYP1A2 P05177 1/20 0.33
MAOA P21397 1/20 0.33
CNR1 P21554 1/20 0.33
DRD4 P21917 1/20 0.33
ACHE P22303 1/20 0.33
HRH2 P25021 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3894772 0.88 GAA (0.41) GAACNR2ALDH1A1HTTMAPT
SCHEMBL5485945 0.86 GAA (0.38) GAACNR2ALDH1A1SLC16A3SLC16A1
SCHEMBL3204526 0.80 CRHR1 (0.39) CNR2ALDH1A1SLC16A3SLC16A1MAPT
SCHEMBL655214 0.78 CNR2 (0.49) GAACNR2ALDH1A1KDM4ETSHR
SCHEMBL2493444 0.75 LMNA (0.42) GAAALDH1A1LMNAMAPTCYP1A2
SCHEMBL5007874 0.75 SLC2A1 (0.45) GAAALDH1A1HTTLMNAMAPT
SCHEMBL5011771 0.74 CNR2 (0.49) CNR2ALDH1A1GFERTDP1MAPK1
SCHEMBL21300769 0.74 LMNA (0.41) GAACNR2ALDH1A1LMNATP53
SCHEMBL11811681 0.73 ABL1 (0.42) CNR2LMNATP53MAPTALOX15
SCHEMBL10427123 0.73 SLC2A1 (0.49) GAACNR2ALDH1A1MAPTALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7662540-B2 Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 FUJIFILM CORPORATION (JP) 2010-02-16 US disclosed
US-7556911-B2 Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method FUJIFILM CORPORATION (JP) 2009-07-07 US disclosed
US-20080311524-A1 Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor AGFA GRAPHICS N.V. (BE) 2008-12-18 US disclosed
US-20080268374-A1 Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process FUJIFILM CORPORATION (JP) 2008-10-30 US disclosed
US-20080118867-A1 Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process ASAHI KASEI E-MATERIALS CORPORATION (JP) 2008-05-22 US disclosed
US-20080113302-A1 Pattern Forming Process FUJIFILM CORPORATION (JP) 2008-05-15 US disclosed
US-20080088813-A1 Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 FUJIFILM CORPORATION (JP) 2008-04-17 US disclosed
US-20070212642-A1 Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
EP-1780599-A1 PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND METHOD OF PATTERN FORMATION FUJIFILM Corporation (JP) 2007-05-02 EP disclosed
US-20060078802-A1 Holographic storage medium SABIC INNOVATIVE PLASTICS IP B.V. 2006-04-13 US disclosed
WO-2005083522-A1 PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-09-09 WO disclosed
WO-2005078776-A1 PATTERN FORMING PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2005-08-25 WO disclosed
US-5030548-A Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists FUJI PHOTO FILM CO., LTD. (JP) 1991-07-09 US disclosed
EP-0239868-B1 PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4857438-A Photochromic system and layers produced therewith BASF AKTIENGESELLSCHAFT (DE) 1989-08-15 US disclosed
US-4332884-A USING A DIOXIME CHELATING AGENT RICOH CO., LTD. (JP) 1982-06-01 US disclosed
US-4315068-A CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS RICOH CO., LTD. (JP) 1982-02-09 US disclosed
US-4306014-A AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM RICOH CO., LTD. (JP) 1981-12-15 US disclosed
US-4271251-A LEUCO DYE, PHOTOOXIDIZER, 2,4-DIHYDROXY-BENZALDOXIME FUJI PHOTO FILM CO., LTD. (JP) 1981-06-02 US disclosed
US-4251619-A Process for forming photo-polymeric image KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-02-17 US disclosed