Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CRHR1 | P34998 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | CNR2 | P34972 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | SLC16A3 | O15427 | 2/20 | 0.35 |
| ▸ | SLC16A1 | P53985 | 2/20 | 0.35 |
| ▸ | GRK6 | P43250 | 1/20 | 0.34 |
| ▸ | EGFR | P00533 | 1/20 | 0.33 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3894773 | 0.87 | ALDH1A1 (0.41) | MAPTCNR2MEN1ALDH1A1KMT2A | |
| SCHEMBL27609979 | 0.84 | CRHR1 (0.39) | CRHR1MAPTCNR2MEN1ALDH1A1 | |
| SCHEMBL5485948 | 0.83 | CRHR1 (0.39) | CRHR1MAPTMEN1ALDH1A1KMT2A | |
| SCHEMBL655214 | 0.82 | CNR2 (0.49) | CNR2ALDH1A1KDM4ETSHRGRK6 | |
| SCHEMBL3204518 | 0.80 | GAA (0.39) | CRHR1MAPTCNR2ALDH1A1RAB9A | |
| SCHEMBL10427123 | 0.79 | SLC2A1 (0.49) | MAPTCNR2MEN1ALDH1A1KMT2A | |
| SCHEMBL3895327 | 0.77 | GRK6 (0.41) | CRHR1MAPTCNR2MEN1ALDH1A1 | |
| SCHEMBL5011771 | 0.77 | CNR2 (0.49) | CNR2ALDH1A1TSHRGRK6EGFR | |
| SCHEMBL5499262 | 0.76 | CNR2 (0.55) | CNR2MEN1ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL3901022 | 0.75 | CNR2 (0.44) | CNR2GRK6EGFRERBB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-55055335-A | — | — | None | — | — | JP | disclosed |
| US-7662540-B2 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7556911-B2 | Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method | FUJIFILM CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| EP-1765592-B1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2009-01-28 | — | — | EP | disclosed |
| US-20080311524-A1 | Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor | AGFA GRAPHICS N.V. (BE) | 2008-12-18 | — | — | US | disclosed |
| US-20080268374-A1 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-20080118867-A1 | Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080113302-A1 | Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| US-20080088813-A1 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2008-04-17 | — | — | US | disclosed |
| US-20070212642-A1 | Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| EP-0239868-B1 | PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE | BASF Aktiengesellschaft (DE) | 1989-12-27 | — | — | EP | disclosed |
| US-4857438-A | Photochromic system and layers produced therewith | BASF AKTIENGESELLSCHAFT (DE) | 1989-08-15 | — | — | US | disclosed |
| US-4332884-A | USING A DIOXIME CHELATING AGENT | RICOH CO., LTD. (JP) | 1982-06-01 | — | — | US | disclosed |
| US-4315068-A | CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS | RICOH CO., LTD. (JP) | 1982-02-09 | — | — | US | disclosed |
| US-4306014-A | AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM | RICOH CO., LTD. (JP) | 1981-12-15 | — | — | US | disclosed |
| US-4271251-A | LEUCO DYE, PHOTOOXIDIZER, 2,4-DIHYDROXY-BENZALDOXIME | FUJI PHOTO FILM CO., LTD. (JP) | 1981-06-02 | — | — | US | disclosed |
| US-4251619-A | Process for forming photo-polymeric image | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| JP-S5555335-A | PHOTOSENSITIVE COMPOSITION | FUJI PHOTO FILM CO LTD | 1980-04-23 | — | — | JP | disclosed |
| US-4139390-A | Presensitized printing plate having a print-out image | EASTMAN KODAK COMPANY (US) | 1979-02-13 | — | — | US | disclosed |