SCHEMBL3204890

SCHEMBL3204890

O=S(=O)(O)c1cc(C(F)(F)F)ccc1F

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDE2A O00408 3/20 0.43
MEN1 O00255 2/20 0.41
TSHR P16473 2/20 0.41
KMT2A Q03164 2/20 0.41
ALDH1A1 P00352 1/20 0.41
ATM Q13315 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
BRD4 O60885 3/20 0.40
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
CA12 O43570 1/20 0.40
CA9 Q16790 1/20 0.40
EPAS1 Q99814 1/20 0.40
CES2 O00748 2/20 0.39
SGK1 O00141 1/20 0.39
ALOX5AP P20292 1/20 0.39
FEN1 P39748 1/20 0.39
MCL1 Q07820 1/20 0.39
IDO1 P14902 1/20 0.39
MMP1 P03956 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28320494 0.98 PDE2A (0.42) PDE2AMEN1TSHRKMT2AALDH1A1
SCHEMBL3204736 0.85 PDE2A (0.43) PDE2AMEN1TSHRKMT2AALDH1A1
Hydrochloric Acid SCHEMBL28294245 0.83 PDE2A (0.42) PDE2ACA1CA2CA12CA9
SCHEMBL12335461 0.81 ALOX5AP (0.50) MEN1TSHRKMT2AALDH1A1ATM
SCHEMBL30543023 0.81 ALOX5AP (0.51) CA1CA2CA12CA9SGK1
SCHEMBL3877555 0.81 MEN1 (0.44) MEN1TSHRKMT2AALDH1A1ATM
SCHEMBL3190051 0.81 CES2 (0.52) PDE2AMEN1TSHRKMT2AALDH1A1
SCHEMBL30161606 0.81 MEN1 (0.44) MEN1TSHRKMT2AALDH1A1ATM
SCHEMBL2777161 0.81 ALOX5AP (0.51) CA1CA2CA12CA9SGK1
SCHEMBL1363127 0.79 ALDH1A1 (0.47) MEN1TSHRKMT2AALDH1A1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 US disclosed