Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.35 |
| ▸ | NR1I2 | O75469 | 2/20 | 0.32 |
| ▸ | ACHE | P22303 | 3/20 | 0.32 |
| ▸ | CA12 | O43570 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | CA3 | P07451 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | CA4 | P22748 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | GMNN | O75496 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | EGFR | P00533 | 1/20 | 0.32 |
| ▸ | FYN | P06241 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18692002 | 0.83 | ALDH1A1 (0.45) | ESR1ESR2CA12CA2LMNA | |
| SCHEMBL18692020 | 0.81 | ACHE (0.46) | ACHENPC1ALDH1A1ALOX15RAB9A | |
| SCHEMBL15981417 | 0.81 | CYP3A4 (0.43) | MAPTTDP1TSHRKDM4ENPC1 | |
| SCHEMBL14889407 | 0.79 | CYP1A2 (0.35) | ESR1ESR2NR1I2LMNATDP1 | |
| SCHEMBL9757509 | 0.79 | CA1 (0.36) | CA12CA2CA4TDP1CA14 | |
| SCHEMBL31158054 | 0.77 | CYP2A6 (0.44) | TDP1TSHRALDH1A1CYP3A4HPGD | |
| SCHEMBL28391991 | 0.77 | ALDH1A1 (0.44) | ESR2TSHRNPC1ALDH1A1HPGD | |
| SCHEMBL5143294 | 0.77 | CYP2A6 (0.44) | TDP1TSHRALDH1A1CYP3A4HPGD | |
| SCHEMBL15985210 | 0.77 | POLB (0.41) | NR1I2ACHELMNAMAPTTDP1 | |
| SCHEMBL31590642 | 0.77 | CA1 (0.52) | CA12CA2LMNAMAPTCA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117887082-A | Resin containing phenylene bis- (dimethylhydroxysilicon) structure for external heat-resistant coating of aircraft and preparation method of resin | 中昊北方涂料工业研究设计院有限公司 | 2024-04-16 | — | — | CN | claimed |
| CN-107696776-B | Manufacturing method of wooden movable character creative hanging piece | 浙江工贸职业技术学院 | 2019-11-08 | — | — | CN | claimed |
| CN-107175738-B | A kind of timber processing and sorting method | 浙江润格木业科技有限公司 | 2019-01-15 | — | — | CN | claimed |
| CN-107699040-A | A kind of preparation method of polyurethane-type ink | 浙江浦江永进工贸有限公司 | 2018-02-16 | — | — | CN | claimed |
| US-6368535-B1 | COPOLYMERIZATION; HIGH STRENGTH, TOUGHNESS | DOW CORNING CORPORATION | 2002-04-09 | — | — | US | claimed |
| JP-2001506283-A | — | — | 2001-05-15 | — | — | JP | claimed |
| EP-0534204-B1 | Base developable negative photoresist and use thereof | IBM (US) | 1997-06-04 | — | — | EP | claimed |
| US-5552466-A | BLEND OF POLYSILSESQUIOXANE AND POLYSILOXANE, FORMS CERAMIC AT HIGH TEMPERATURE | HITCO TECHNOLOGIES INC. (US) | 1996-09-03 | — | — | US | claimed |
| EP-0686173-A4 | SILICONE COMPOSITE MATERIALS HAVING HIGH TEMPERATURE RESISTANCE | BP CHEMICALS HITCO INC (US) | 1996-07-31 | — | — | EP | claimed |
| EP-0686173-A1 | SILICONE COMPOSITE MATERIALS HAVING HIGH TEMPERATURE RESISTANCE | HITCO TECHNOLOGIES INC. (US) | 1995-12-13 | — | — | EP | claimed |
| US-5457005-A | Dry developable photoresist and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1995-10-10 | — | — | US | claimed |
| WO-1995016751-A1 | SILICONE COMPOSITE MATERIALS HAVING HIGH TEMPERATURE RESISTANCE | BP CHEMICALS (HITCO) INC. (US) | 1995-06-22 | — | — | WO | claimed |
| US-5286599-A | Base developable negative photoresist composition and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-02-15 | — | — | US | claimed |
| US-5229251-A | Dry developable photoresist containing an epoxide, organosilicon and onium salt | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 1993-07-20 | — | — | US | claimed |
| EP-0534204-A1 | Base developable negative photoresist and use thereof | International Business Machines Corporation (US) | 1993-03-31 | — | — | EP | claimed |
| US-4778871-A | SILPHENYLENE-VINYLMETHYLSILOXANE ELASTOMER CURED WITH MIXTURE HYDROSILYLATION AND URETHANE CURING AGENTS | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1988-10-18 | — | — | US | claimed |
| US-4513132-A | ORGANOSILSESQUIOZANE, SILICONE, BASIC CATALYST AND SOLVENT; DIELECTRICS; FILMS | HITACHI, LTD. (JP) | 1985-04-23 | — | — | US | claimed |
| US-4481279-A | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1984-11-06 | — | — | US | claimed |
| JP-62250432-A | — | — | None | — | — | JP | disclosed |
| US-3965134-A | Process for making silarylenesilanediol | GENERAL ELECTRIC COMPANY (US) | 1976-06-22 | — | — | US | disclosed |