Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.32 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | KDM1A | O60341 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL958157 | 0.77 | EPHX1 (0.37) | EPHX1EPHX2L3MBTL1ALDH1A1HSD17B10 | |
| SCHEMBL888272 | 0.73 | EPHX1 (0.38) | EPHX1EPHX2L3MBTL1ALDH1A1HSD11B1 | |
| SCHEMBL6555589 | 0.72 | HSD11B1 (0.39) | EPHX1EPHX2L3MBTL1ALDH1A1HSD11B1 | |
| SCHEMBL6555586 | 0.72 | HSD11B1 (0.39) | EPHX1EPHX2L3MBTL1ALDH1A1HSD11B1 | |
| SCHEMBL888449 | 0.69 | L3MBTL1 (0.35) | EPHX1EPHX2L3MBTL1ALDH1A1HSD11B1 | |
| SCHEMBL16435696 | 0.65 | EPHX1 (0.49) | EPHX1EPHX2L3MBTL1HSD17B10HSD11B1 | |
| SCHEMBL6655791 | 0.65 | CYP2C9 (0.35) | EPHX1EPHX2 | |
| SCHEMBL14859427 | 0.64 | CHRNB2 (0.45) | EPHX2L3MBTL1CHRNB2CHRNA4HSD11B1 | |
| SCHEMBL28944812 | 0.64 | CHRNB2 (0.45) | EPHX2L3MBTL1CHRNB2CHRNA4HSD11B1 | |
| Adamantane SCHEMBL34463641 | 0.64 | CHRNB2 (0.43) | EPHX1EPHX2L3MBTL1ALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8586281-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-19 | — | — | US | disclosed |
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20100055606-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2010-03-04 | — | — | US | disclosed |