Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | ITGB1 | P05556 | 1/20 | 0.33 |
| ▸ | ITGA4 | P13612 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.32 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3217482 | 0.77 | EPHX1 (0.37) | EPHX1EPHX2ALDH1A1L3MBTL1HSD17B10 | |
| SCHEMBL888272 | 0.73 | EPHX1 (0.38) | EPHX1EPHX2ALDH1A1L3MBTL1KMT2A | |
| SCHEMBL6555589 | 0.72 | HSD11B1 (0.39) | EPHX1EPHX2ALDH1A1L3MBTL1ITGB1 | |
| SCHEMBL6555586 | 0.72 | HSD11B1 (0.39) | EPHX1EPHX2ALDH1A1L3MBTL1ITGB1 | |
| SCHEMBL888449 | 0.69 | L3MBTL1 (0.35) | EPHX1EPHX2ALDH1A1L3MBTL1 | |
| SCHEMBL15618893 | 0.69 | — | — | |
| SCHEMBL15216856 | 0.67 | EPHX1 (0.36) | EPHX1EPHX2ALDH1A1L3MBTL1 | |
| SCHEMBL2554561 | 0.65 | TP53 (0.47) | ALDH1A1KMT2ANPSR1 | |
| SCHEMBL16435696 | 0.65 | EPHX1 (0.49) | EPHX1EPHX2L3MBTL1HSD17B10 | |
| SCHEMBL31572346 | 0.65 | THRB (0.44) | ALDH1A1KMT2ANPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116615405-A | Compound, polymer, composition for film formation, method for forming pattern, method for forming insulating film, and method for producing compound | 三菱瓦斯化学株式会社 | 2023-08-18 | — | — | CN | disclosed |
| CN-112424283-A | Composition for forming optical member, compound and resin | 三菱瓦斯化学株式会社 | 2021-02-26 | — | — | CN | disclosed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |
| WO-2020226150-A1 | COMPOUND AND PRODUCTION METHOD THEREOF, RESIN, COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, UNDERLAYER FILM FOR LITHOGRAPHY, OPTICAL COMPONENT, AND METHOD FOR PURIFYING COMPOUND OR RESIN | 学校法人 関西大学 | 2020-11-12 | — | — | WO | disclosed |
| CN-111615507-A | Compound, resin, composition, and pattern forming method | 三菱瓦斯化学株式会社 | 2020-09-01 | — | — | CN | disclosed |
| CN-106462059-B | Resist material, resist composition, and resist pattern forming method | 三菱瓦斯化学株式会社 | 2020-07-28 | — | — | CN | disclosed |
| CN-104995559-B | Resist composition, resist pattern forming method, and polyphenol derivative used therefor | 三菱瓦斯化学株式会社 | 2020-04-07 | — | — | CN | disclosed |
| WO-2020027206-A1 | OPTICAL COMPONENT-FORMING COMPOSITION, OPTICAL COMPONENT, COMPOUND, AND RESIN | 三菱瓦斯化学株式会社 | 2020-02-06 | — | — | WO | disclosed |
| US-9244349-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-20110008728-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100310985-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-09 | — | — | US | disclosed |