Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 3/20 | 0.35 |
| ▸ | MMP1 | P03956 | 1/20 | 0.35 |
| ▸ | MMP7 | P09237 | 1/20 | 0.35 |
| ▸ | MMP12 | P39900 | 1/20 | 0.35 |
| ▸ | ECE1 | P42892 | 1/20 | 0.35 |
| ▸ | MMP13 | P45452 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 8/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | FAAH | O00519 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29144931 | 1.00 | NAAA (0.35) | NAAAMMP1MMP7MMP12ECE1 | |
| SCHEMBL36675 | 0.94 | — | — | |
| SCHEMBL36482 | 0.94 | — | — | |
| SCHEMBL2958603 | 0.89 | MEN1 (0.34) | MMP1MMP7MMP12ECE1MMP13 | |
| SCHEMBL36923 | 0.89 | MMP1 (0.30) | MMP1MMP7MMP12ECE1MMP13 | |
| SCHEMBL7062010 | 0.88 | MMP1 (0.33) | MMP1MMP7MMP12ECE1MMP13 | |
| SCHEMBL31589390 | 0.86 | MMP1 (0.41) | MMP1MMP7MMP12ECE1MMP13 | |
| SCHEMBL36061 | 0.86 | — | — | |
| SCHEMBL5552022 | 0.85 | MMP1 (0.33) | MMP1MMP7MMP12ECE1MMP13 | |
| SCHEMBL3250993 | 0.84 | MMP1 (0.31) | MMP1MMP7MMP12ECE1MMP13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117467307-A | curable composition | 东京应化工业株式会社 | 2024-01-30 | — | — | CN | disclosed |
| US-8574809-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20100055606-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2010-03-04 | — | — | US | disclosed |