SCHEMBL3250993

SCHEMBL3250993

CCS(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 1/20 0.31
MMP7 P09237 1/20 0.31
MMP12 P39900 1/20 0.31
ECE1 P42892 1/20 0.31
MMP13 P45452 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27565867 0.98
SCHEMBL2958603 0.88 MEN1 (0.34) MMP1MMP7MMP12ECE1MMP13
SCHEMBL36061 0.87
SCHEMBL10072232 0.87
SCHEMBL36845 0.85 CA12 (0.30)
SCHEMBL3219159 0.84 NAAA (0.35) MMP1MMP7MMP12ECE1MMP13
SCHEMBL29144931 0.84 NAAA (0.35) MMP1MMP7MMP12ECE1MMP13
SCHEMBL36923 0.84 MMP1 (0.30) MMP1MMP7MMP12ECE1MMP13
SCHEMBL5552022 0.83 MMP1 (0.33) MMP1MMP7MMP12ECE1MMP13
SCHEMBL3190765 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-RE40211-E1 Diazodisulfones WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2008-04-01 US claimed
US-7026497-B2 Adhesive compound and method for forming photoresist pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-04-11 US claimed
US-20050158651-A1 Adhesive compound and method for forming photoresist pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-07-21 US claimed
EP-0440375-B1 Diazodisulfones WAKO PURE CHEM IND LTD (JP) 1994-07-13 EP claimed
EP-0440375-A1 Diazodisulfones WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1991-08-07 EP claimed
US-12612500-B2 Heat labile foam-in-place polyurethane foam BATTELLE SAVANNAH RIVER ALLIANCE LLC (US) 2026-04-28 US disclosed
US-20240141127-A1 HEAT LABILE FOAM-IN-PLACE POLYURETHANE FOAM UNITED STATES DEPARTMENT OF ENERGY 2024-05-02 US disclosed
CN-117467307-A curable composition 东京应化工业株式会社 2024-01-30 CN disclosed
EP-3896522-B1 PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO LTD (JP) 2023-05-03 EP disclosed
EP-3896522-A1 PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-10-20 EP disclosed
US-7833691-B2 Heterocycle-bearing onium salts WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-16 US disclosed
EP-1953149-B1 A heterocycle-containing onium salt WAKO PURE CHEM IND LTD (JP) 2010-10-06 EP disclosed
EP-0887706-A1 Resist composition containing specific cross-linking agent WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 1998-12-30 EP disclosed
US-5852128-A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT AG (CH) 1998-12-22 US disclosed
EP-0875789-A1 Resist composition and its use for forming pattern WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1998-11-04 EP disclosed
EP-0875496-A1 Acrylic or methacrylic acid derivatives and polymers obtained therefrom WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1998-11-04 EP disclosed
EP-0827970-A2 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Clariant AG (CH) 1998-03-11 EP disclosed
EP-0440375-B1 Diazodisulfones WAKO PURE CHEM IND LTD (JP) 1994-07-13 EP disclosed
US-5216135-A Photosensitive material which generates an acid by irradiation ; high transmittance, solution stability in photoresists and dissolution inhibiting of photoresists in alkali developers WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1993-06-01 US disclosed
EP-0440375-A1 Diazodisulfones WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1991-08-07 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12612500-B2 Heat labile foam-in-place polyurethane foam PUF60, OGG1, EIF3L MMP1 1993/4885MMP7 4294/4885MMP12 4383/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.