SCHEMBL3224110

SCHEMBL3224110

Oc1c(C2c3ccccc3-c3ccccc32)ccc2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
PTPN22 Q9Y2R2 1/20 0.48
MAPT P10636 2/20 0.43
KDM4E B2RXH2 1/20 0.43
ALOX12 P18054 1/20 0.43
ALDH1A1 P00352 2/20 0.42
NPSR1 Q6W5P4 1/20 0.42
CYP1A2 P05177 2/20 0.42
LDHA P00338 1/20 0.42
KDM1A O60341 1/20 0.42
HSD17B10 Q99714 2/20 0.39
CYP2A6 P11509 1/20 0.39
TSHR P16473 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
HPGD P15428 1/20 0.39
CYP2C19 P33261 1/20 0.39
HIF1A Q16665 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6675754 0.82 KDM1A (0.53) MAPTKDM4EALOX12ALDH1A1NPSR1
SCHEMBL16481156 0.82 KDM1A (0.48) MAPTKDM4EALOX12ALDH1A1NPSR1
SCHEMBL3200642 0.77 ALDH1A1 (0.42) MAPTKDM4EALOX12ALDH1A1NPSR1
SCHEMBL6237100 0.76 ALDH1A1 (0.46) MAPTKDM4EALOX12ALDH1A1HSD17B10
SCHEMBL28757848 0.75 ALDH1A1 (0.42) MAPTKDM4EALOX12ALDH1A1NPSR1
SCHEMBL3191219 0.75 EPHX1 (0.40) MAPTKDM4EALOX12ALDH1A1NPSR1
SCHEMBL3846107 0.74 ERN1 (0.50) MAPTKDM4EALOX12ALDH1A1NPSR1
SCHEMBL3192348 0.74 KDM1A (0.36) MAPTKDM4EALOX12ALDH1A1NPSR1
SCHEMBL8339930 0.72 HPGD (0.46) MAPTKDM4EALOX12ALDH1A1HSD17B10
SCHEMBL4443508 0.72 PTPN22 (0.56) PTPN22MAPTKDM4EALDH1A1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106662819-B Resist underlayer film forming composition containing novolak resin obtained by reaction of aromatic methylol compound 日产化学工业株式会社 2021-06-25 CN disclosed
CN-105209974-B Resist underlayer film forming composition containing novolac resin using bisphenol 日产化学工业株式会社 2020-05-29 CN disclosed
CN-105874386-B Resist underlayer film-forming composition containing novolac polymer having secondary amino group 日产化学工业株式会社 2019-12-06 CN disclosed
US-20100059739-A1 ORGANIC ELECTROLUMINESCENCE ELEMENT, IMAGE DISPLAY DEVICE, AND IMAGING APPARATUS CANON KABUSHIKI KAISHA (JP) 2010-03-11 US disclosed
US-4460681-A COLOR FORMING LAYERS, AND SOLVENT SOLUBLE BARRIE LAYERS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1984-07-17 US disclosed