SCHEMBL3228304

SCHEMBL3228304

CCOCNC(=O)OCC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.44
MGAM O43451 1/20 0.44
SI P14410 1/20 0.44
MGAM2 Q2M2H8 1/20 0.44
ALDH1A1 P00352 3/20 0.42
LMNA P02545 1/20 0.40
HSD17B10 Q99714 1/20 0.40
TSHR P16473 2/20 0.40
KMT2A Q03164 2/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
GLA P06280 1/20 0.40
ACHE P22303 1/20 0.39
ALOX15 P16050 1/20 0.39
SOAT1 P35610 1/20 0.39
EGLN1 Q9GZT9 1/20 0.38
CYP1A2 P05177 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
MEN1 O00255 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12582072 0.85 ACHE (0.48) ALDH1A1TSHRGLAACHE
SCHEMBL18211940 0.81 ACHE (0.41) GAAMGAMSIMGAM2KMT2A
SCHEMBL19397784 0.81 GAA (0.33) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL9075082 0.81
SCHEMBL11078575 0.80
SCHEMBL11773251 0.80 TSHR (0.40) ALDH1A1HSD17B10TSHRKMT2ASMN1; SMN2
SCHEMBL13525266 0.80 TSHR (0.36) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL14195923 0.79 ALDH1A1 (0.56) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL19034083 0.78 CHRNB2 (0.47) ALDH1A1HSD17B10TSHRACHE
SCHEMBL9495238 0.77 ACHE (0.50) ALDH1A1LMNATSHRKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100068480-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same CITICORP NORTH AMERICA, INC., AS AGENT 2010-03-18 US disclosed
US-20060275702-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same TAKANASHI HIROSHI 2006-12-07 US disclosed
US-20060057495-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same TAKANASHI HIROSHI 2006-03-16 US disclosed
US-20010019811-A1 Negative-working photosensitive resin composition and photosensitive resin plate using the same TAKANASHI HIROSHI (JP) 2001-09-06 US disclosed