SCHEMBL3239122

SCHEMBL3239122

CCOc1ccc(N(c2ccc(OCC)cc2)c2ccc(OCC)cc2)cc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO1 P15559 1/20 0.74
TSHR P16473 1/20 0.58
TDP1 Q9NUW8 1/20 0.58
LTA4H P09960 2/20 0.54
ALDH1A1 P00352 3/20 0.54
KDM4E B2RXH2 2/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
PARP10 Q53GL7 1/20 0.48
RELA Q04206 1/20 0.48
CA12 O43570 1/20 0.48
CA1 P00915 1/20 0.48
CA2 P00918 1/20 0.48
CA7 P43166 1/20 0.48
CA9 Q16790 1/20 0.48
PRSS1 P07477 1/20 0.48
PRSS2 P07478 1/20 0.48
PRSS3 P35030 1/20 0.48
POLB P06746 1/20 0.47
MAPT P10636 2/20 0.47
ADRA2A P08913 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8943785 0.93 LTA4H (0.65) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL19017946 0.93 NQO1 (0.64) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL8943626 0.91 NQO1 (0.61) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL6306948 0.91 LTA4H (0.63) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL8944052 0.91 LTA4H (0.63) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL8944288 0.91 NQO1 (0.61) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL8085396 0.89 NQO1 (0.58) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL6342735 0.89 NQO1 (0.58) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL8944240 0.89 LTA4H (0.70) NQO1TSHRTDP1LTA4HALDH1A1
SCHEMBL8943757 0.87 NQO1 (0.56) NQO1TSHRTDP1LTA4HALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4496646-A Photosensitive imaging material SONY CORPORATION (JP) 1985-01-29 US claimed
US-20100304570-A1 ETCHING METHOD AND METHOD FOR MANUFACTURING OPTICAL/ELECTRONIC DEVICE USING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2010-12-02 US disclosed
EP-2211373-A1 ETCHING METHOD AND METHOD FOR MANUFACTURING OPTICAL/ELECTRONIC DEVICE USING THE SAME Mitsubishi Chemical Corporation (JP) 2010-07-28 EP disclosed
US-20070051403-A1 Photoelectric Converter and Dye Sensitized Solar Cell KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2007-03-08 US disclosed
US-20050287455-A1 Electrophotographic photoreceptor and image forming apparatus provided with the same SHARP KABUSHIKI KAISHA (JP) 2005-12-29 US disclosed
US-5480765-A PRESSURE AND HEAT SENSITIVE PAPER, IMPROVED PHOTOSTABILITY BY ADDITION OF TRIARYLAMINE COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1996-01-02 US disclosed
US-4144260-A Production of aluminum salts of N-nitroso-N-alkyl-hydroxylamines BASF AKTIENGESELLSCHAFT (DE) 1979-03-13 US disclosed