SCHEMBL3249133

SCHEMBL3249133

CCCC(=CC1CCCCC1C)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 2/20 0.34
GRIK2 Q13002 1/20 0.34
EPHX1 P07099 3/20 0.32
MEN1 O00255 1/20 0.30
POLB P06746 1/20 0.30
MAPT P10636 1/20 0.30
KMT2A Q03164 1/20 0.30
FFAR3 O14843 1/20 0.30
HDAC3 O15379 1/20 0.30
HDAC1 Q13547 1/20 0.30
HDAC2 Q92769 1/20 0.30
HDAC8 Q9BY41 1/20 0.30
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2090331 0.77 GRIK1 (0.54) GRIK1GRIK2EPHX1FFAR3HDAC3
SCHEMBL15673307 0.74 EPHX1 (0.38) EPHX1
SCHEMBL4165010 0.73 ALDH1A1 (0.41) EPHX1ALDH1A1
SCHEMBL503447 0.73 ALDH1A1 (0.41) EPHX1ALDH1A1
SCHEMBL2219955 0.69 ALDH1A1 (0.41) EPHX1ALDH1A1
SCHEMBL322607 0.68 GRIK1 (0.51) GRIK1GRIK2EPHX1MEN1POLB
SCHEMBL692340 0.68 GRIK1 (0.51) GRIK1GRIK2EPHX1MEN1POLB
SCHEMBL15913409 0.68 PPM1B (0.32) EPHX1ALDH1A1
SCHEMBL15913591 0.67 NPSR1 (0.42) MEN1MAPTKMT2AALDH1A1
SCHEMBL2536866 0.67 GRIK1 (0.50) GRIK1GRIK2MEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1353225-B1 Radiation sensitive composition and compound FUJIFILM CORP (JP) 2014-06-04 EP disclosed
EP-1296190-B1 Positive resist composition FUJIFILM CORP (JP) 2010-05-05 EP disclosed
US-7510822-B2 Stimulation sensitive composition and compound FUJIFILM CORPORATION (JP) 2009-03-31 US disclosed
US-7255971-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2007-08-14 US disclosed
US-20030224288-A1 Stimulation sensitive composition and compound FUJI PHOTO FILM CO., LTD. 2003-12-04 US disclosed
EP-1353225-A2 Radiation sensitive composition and compound FUJI PHOTO FILM CO., LTD. (JP) 2003-10-15 EP disclosed
US-20030134225-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 US disclosed
EP-1296190-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2003-03-26 EP disclosed