Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 4/20 | 0.64 |
| ▸ | MMP13 | P45452 | 6/20 | 0.61 |
| ▸ | MMP8 | P22894 | 2/20 | 0.61 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.59 |
| ▸ | MMP1 | P03956 | 4/20 | 0.58 |
| ▸ | CA1 | P00915 | 2/20 | 0.53 |
| ▸ | CA2 | P00918 | 2/20 | 0.53 |
| ▸ | MMP2 | P08253 | 1/20 | 0.53 |
| ▸ | MMP9 | P14780 | 1/20 | 0.53 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.53 |
| ▸ | PLCG1 | P19174 | 1/20 | 0.52 |
| ▸ | NPC1 | O15118 | 1/20 | 0.52 |
| ▸ | PKLR | P30613 | 1/20 | 0.52 |
| ▸ | RAB9A | P51151 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6708168 | 0.86 | PKM (0.64) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL11816231 | 0.85 | PKM (0.52) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL9705169 | 0.84 | PKM (0.61) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL13239545 | 0.83 | MMP13 (0.51) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL11797251 | 0.83 | PKM (0.59) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL9109608 | 0.83 | PKM (0.59) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL9703007 | 0.83 | HTT (0.66) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL14468640 | 0.83 | PKM (0.59) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL11986342 | 0.81 | MMP13 (0.61) | PKMMMP13MMP8HTTNPSR1 | |
| SCHEMBL4195258 | 0.81 | MMP13 (0.66) | PKMMMP13MMP8HTTNPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115185156-A | Photosensitive resin composition for forming partition wall, organic electroluminescent element, image display device, and illumination | 三菱化学株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-109661855-B | Photosensitive resin composition for forming organic electroluminescent element spacer, organic electroluminescent element, image display device, and lighting | 三菱化学株式会社 | 2022-07-08 | — | — | CN | disclosed |
| CN-109661855-A | Photosensitive resin composition for forming organic electroluminescent element partition wall, organic electroluminescent element, image display device, and illumination | 三菱化学株式会社 | 2019-04-19 | — | — | CN | disclosed |
| EP-0989460-B1 | PATTERN FORMING METHOD | AZ ELECTRONIC MATERIALS USA (US) | 2010-05-26 | — | — | EP | disclosed |
| US-7638654-B2 | 1-fluoro-1, 1-bis-(phenylsulfonyl)methane and production method thereof | NAGOYA INSTITUTE OF TECHNOLOGY (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090131723-A1 | 1-Fluoro-1,1-Bis-(Phenylsulfonyl)Methane and Production Method Thereof | TOSOH F-TECH, INC. (JP) | 2009-05-21 | — | — | US | disclosed |
| EP-1992612-A1 | 1-FLUORO-1,1-BIS(PHENYLSULFONYL)METHANE AND METHOD FOR PRODUCING SAME | NAGOYA INSTITUTE OF TECHNOLOGY (JP) | 2008-11-19 | — | — | EP | disclosed |
| US-6527966-B1 | Forming a pattern composed of an etchable layer by conducting dry etching of an etchable layer formed on a substrate for semiconductor through a mask of patterned radiation sensitive material coating formed on the etchable layer | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-04 | — | — | US | disclosed |
| US-6479210-B2 | COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-11-12 | — | — | US | disclosed |
| US-20010036589-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2001-11-01 | — | — | US | disclosed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | disclosed |
| EP-0989460-A1 | PATTERN FORMING METHOD | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| EP-0989459-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090131723-A1 | 1-Fluoro-1,1-Bis-(Phenylsulfonyl)Methane and Production Method Thereof | CYP2S1, ARSA, MSMO1 | PKM 2705/4885MMP13 4576/4885MMP8 4313/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.