Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 6/20 | 0.44 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.41 |
| ▸ | CA6 | P23280 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL4890762 | 0.98 | ALDH1A1 (0.45) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| Hydrochloric Acid SCHEMBL4891176 | 0.98 | ALDH1A1 (0.45) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| SCHEMBL4890754 | 0.85 | CES2 (0.36) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| SCHEMBL28671195 | 0.84 | CA12 (0.38) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| SCHEMBL4891168 | 0.84 | ALDH1A1 (0.46) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| SCHEMBL8156295 | 0.83 | ALDH1A1 (0.48) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| SCHEMBL4041905 | 0.79 | ALDH1A1 (0.48) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| SCHEMBL465752 | 0.78 | ALDH1A1 (0.56) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| SCHEMBL6756199 | 0.78 | ALDH1A1 (0.56) | ALDH1A1ALOX15KMT2AGAATDP1 | |
| SCHEMBL30281127 | 0.78 | ALDH1A1 (0.56) | ALDH1A1ALOX15KMT2AGAATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10707422-B2 | Production of organic phosphorescent layers with addition of heavy main group metal complexes | SIEMENS AKTIENGESELLSCHAFT (DE) | 2020-07-07 | — | — | US | claimed |
| EP-2999766-B1 | PRODUCTION OF ORGANIC PHOSPHORESCENT LAYERS WITH ADDITION OF HEAVY MAIN GROUP METAL COMPLEXES | SIEMENS AG (DE) | 2017-11-15 | — | — | EP | claimed |
| US-20160181540-A1 | Production Of Organic Phosphorescent Layers With Addition Of Heavy Main Group Metal Complexes | SIEMENS AKTIENGESELLSCHAFT (DE) | 2016-06-23 | — | — | US | claimed |
| EP-1546221-A4 | PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY | DU PONT (US) | 2008-06-18 | — | — | EP | claimed |
| US-7264914-B2 | Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-09-04 | — | — | US | claimed |
| US-20050277052-A1 | Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-12-15 | — | — | US | claimed |
| EP-1546221-A2 | PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY | E. I. du Pont de Nemours and Company (US) | 2005-06-29 | — | — | EP | claimed |
| WO-2004014964-A2 | PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-02-19 | — | — | WO | claimed |
| US-10707422-B2 | Production of organic phosphorescent layers with addition of heavy main group metal complexes | SIEMENS AKTIENGESELLSCHAFT (DE) | 2020-07-07 | — | — | US | disclosed |
| US-20160181540-A1 | Production Of Organic Phosphorescent Layers With Addition Of Heavy Main Group Metal Complexes | SIEMENS AKTIENGESELLSCHAFT (DE) | 2016-06-23 | — | — | US | disclosed |
| EP-1546221-B1 | FLUORINATED POLYMERS HAVING POLYCYCLIC GROUPS WITH FUSED 4-MEMBERED HETEROCYCLIC RINGS, USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2010-03-10 | — | — | EP | disclosed |
| US-7405331-B2 | High-purity (fluoroalkyl)benzene derivative and process for producing the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-07-29 | — | — | US | disclosed |
| EP-1546221-A4 | PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY | DU PONT (US) | 2008-06-18 | — | — | EP | disclosed |
| US-7264914-B2 | Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-09-04 | — | — | US | disclosed |
| US-20060167324-A1 | High-purity (fluoroalkyl)benzene derivative and process for producing the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-07-27 | — | — | US | disclosed |
| US-20050277052-A1 | Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-12-15 | — | — | US | disclosed |
| EP-1546221-A2 | PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY | E. I. du Pont de Nemours and Company (US) | 2005-06-29 | — | — | EP | disclosed |
| EP-1500641-A1 | HIGH-PURITY (FLUOROALKYL)BENZENE DERIVATIVE AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-01-26 | — | — | EP | disclosed |
| WO-2004014964-A2 | PHOTORESISTS, FLUORINATED POLYMERS AND PROCESSES FOR 157 nm MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-02-19 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060167324-A1 | High-purity (fluoroalkyl)benzene derivative and process for producing the same | HBB, AFF4, AFF2 | ALDH1A1 669/4885ALOX15 1401/4885KMT2A 1619/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.