SCHEMBL3272460

SCHEMBL3272460

CCc1cc(O)c(C2CCCCC2)cc1C(c1ccccc1O)c1cc(C2CCCCC2)c(O)cc1CC

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ NUDT1 P36639 1/20 0.38
▸ BACE1 P56817 1/20 0.38
▸ HSP90AA1 P07900 1/20 0.38
▸ TSHR P16473 1/20 0.37
▸ HDAC4 P56524 1/20 0.35
▸ HDAC2 Q92769 1/20 0.35
▸ HDAC8 Q9BY41 1/20 0.35
▸ PTGDR2 Q9Y5Y4 2/20 0.35
▸ KMT2A Q03164 2/20 0.33
▸ GABRA1 P14867 1/20 0.33
▸ GABRB2 P47870 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ THRB P10828 1/20 0.32
▸ CNR1 P21554 2/20 0.32
▸ CNR2 P34972 2/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ HRH3 Q9Y5N1 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3275606 0.91 NUDT1 (0.39) NUDT1BACE1HSP90AA1TSHRGABRA1
SCHEMBL28278535 0.88 NUDT1 (0.43) NUDT1BACE1HSP90AA1TSHRHDAC4
SCHEMBL30127784 0.84 NUDT1 (0.37) NUDT1BACE1HSP90AA1TSHRHDAC4
SCHEMBL757158 0.84 NUDT1 (0.37) NUDT1BACE1HSP90AA1TSHRHDAC4
SCHEMBL3272159 0.84 GABRA1 (0.46) NUDT1BACE1HSP90AA1TSHRHDAC4
SCHEMBL29375612 0.84 NUDT1 (0.37) NUDT1BACE1HSP90AA1TSHRHDAC4
SCHEMBL29484425 0.78 GABRA1 (0.35) NUDT1BACE1HSP90AA1TSHRHDAC4
SCHEMBL760343 0.78 GABRA1 (0.35) NUDT1BACE1HSP90AA1TSHRHDAC4
SCHEMBL8143901 0.78 TSHR (0.47) BACE1HSP90AA1TSHRKMT2AGABRA1
SCHEMBL9138960 0.77 GABRA1 (0.34) NUDT1BACE1HSP90AA1TSHRHDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107544209-A Positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2018-01-05 — — CN disclosed
EP-1602977-B1 Positive resist composition and compound used therein TOKYO OHKA KOGYO CO LTD (JP) 2010-06-30 — — EP disclosed
US-7232643-B2 Positive resist composition and compound used therein TOKYO OHKA KOGYO CO., LTD. (JP) 2007-06-19 — — US disclosed
EP-1602977-A1 Positive resist composition and compound used therein TOKYO OHKA KOGYO CO., LTD. (JP) 2005-12-07 — — EP disclosed
US-20050266340-A1 Positive resist composition and compound used therein TOKYO OHKA KOGYO CO., LTD. (JP) 2005-12-01 — — US disclosed
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