Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NUDT1 | P36639 | 1/20 | 0.37 |
| ▸ | BACE1 | P56817 | 1/20 | 0.37 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.37 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.35 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.34 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.34 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.33 |
| ▸ | MEN1 | O00255 | 4/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | PTGDR2 | Q9Y5Y4 | 2/20 | 0.31 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30127784 | 1.00 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1GABRA1GABRB2 | |
| SCHEMBL29375612 | 1.00 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1GABRA1GABRB2 | |
| SCHEMBL278769 | 0.90 | NUDT1 (0.40) | NUDT1BACE1HSP90AA1KMT2AMEN1 | |
| SCHEMBL9356995 | 0.89 | HDAC4 (0.35) | NUDT1BACE1HSP90AA1HDAC4HDAC2 | |
| SCHEMBL760343 | 0.89 | GABRA1 (0.35) | NUDT1BACE1HSP90AA1GABRA1GABRB2 | |
| SCHEMBL29484425 | 0.89 | GABRA1 (0.35) | NUDT1BACE1HSP90AA1GABRA1GABRB2 | |
| SCHEMBL15703018 | 0.88 | NUDT1 (0.32) | NUDT1BACE1HSP90AA1 | |
| SCHEMBL7804680 | 0.87 | PTGS2 (0.38) | NUDT1BACE1HSP90AA1GABRA1GABRB2 | |
| SCHEMBL3272159 | 0.86 | GABRA1 (0.46) | NUDT1BACE1HSP90AA1GABRA1GABRB2 | |
| SCHEMBL278752 | 0.86 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1LMNAPTGDR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 410 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | claimed |
| US-5401605-A | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-03-28 | — | — | US | claimed |
| JP-10072408-A | — | — | None | — | — | JP | disclosed |
| US-20260062580-A1 | REVERSIBLY THERMOCHROMIC COMPOSITION, REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT ENCAPSULATING REVERSIBLY THERMOCHROMIC COMPOSITION, AND WRITING INSTRUMENT USING REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT | THE PILOT INK CO., LTD. (JP) | 2026-03-05 | — | — | US | disclosed |
| EP-3954745-B1 | REVERSIBLY THERMOCHROMIC AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND REFILL AND WATER-BASED BALLPOINT PEN EACH INTERNALLY CONTAINING SAME | KK PILOT CORPORATION ALSO TRADING AS PILOT CORPORATION (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-12460099-B2 | Reversibly thermochromic composition, reversibly thermochromic microcapsule pigment encapsulating reversibly thermochromic composition, and writing instrument using reversibly thermochromic microcapsule pigment | THE PILOT INK CO., LTD. (JP) | 2025-11-04 | — | — | US | disclosed |
| US-12421411-B2 | Aqueous ink composition for reversibly thermochromic writing instrument, and refill and aqueous ballpoint pen incorporating aqueous ink composition for reversibly thermochromic writing instrument | KABUSHIKI KAISHA PILOT CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| WO-2025079919-A1 | PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, INSULATING FILM, AND SEMICONDUCTOR DEVICE | 주식회사 엘지화학 | 2025-04-17 | — | — | WO | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| US-20240270891-A1 | PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKALINE DEVELOPABLE RESIST, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHENOLIC HYDROXY GROUP-CONTAINING RESIN | DIC CORPORATION (JP) | 2024-08-15 | — | — | US | disclosed |
| US-20240248396-A1 | XANTHENE COMPOUND, RESIN COMPOSITION, CURED OBJECT, METHOD FOR PRODUCING CURED OBJECT, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2024-07-25 | — | — | US | disclosed |
| US-5601961-A | QUINONE DIAZIDE GROUP-CONTAINING COMPOUND AS PHOTOSENSITIZING AGENT, ALKALI-SOLUBLE RESINOUS INGREDIENT AS FILM-FORMING AGENT MADE FROM A BLEND OF AT LEAST TWO NOVOLAK-TYPE RESINS FROM M-AND P-CRESOL, A XYLENOL AND A TRIMETHYLPHENOL | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-11 | — | — | US | disclosed |
| EP-0745575-A1 | Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-04 | — | — | EP | disclosed |
| EP-0744661-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-11-27 | — | — | EP | disclosed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| EP-0740213-A2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | disclosed |
| US-5401605-A | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-03-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260062580-A1 | REVERSIBLY THERMOCHROMIC COMPOSITION, REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT ENCAPSULATING REVERSIBLY THERMOCHROMIC COMPOSITION, AND WRITING INSTRUMENT USING REVERSIBLY THERMOCHROMIC MICROCAPSULE PIGMENT | TYR, SCO2, HBB | NUDT1 1610/4885BACE1 4659/4885HSP90AA1 1824/4885 |
| US-20240248396-A1 | XANTHENE COMPOUND, RESIN COMPOSITION, CURED OBJECT, METHOD FOR PRODUCING CURED OBJECT, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE | NLRP3, XPA, ASIC1 | NUDT1 1771/4885BACE1 1032/4885HSP90AA1 578/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.