SCHEMBL3273157

SCHEMBL3273157

Oc1ccc(C(c2ccccc2O)c2ccc(O)cc2C2CCCCC2)c(C2CCCCC2)c1

nearest known ligand 0.36

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ HDAC4 P56524 1/20 0.36
▸ HDAC2 Q92769 1/20 0.36
▸ HDAC8 Q9BY41 1/20 0.36
▸ NUDT1 P36639 1/20 0.35
▸ BACE1 P56817 1/20 0.35
▸ HSP90AA1 P07900 1/20 0.35
▸ PTGDR2 Q9Y5Y4 1/20 0.35
▸ ESR1 P03372 4/20 0.35
▸ ESR2 Q92731 4/20 0.35
▸ TYR P14679 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ MAPT P10636 1/20 0.33
▸ GABRA1 P14867 1/20 0.33
▸ GABRB2 P47870 1/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ PTPN5 P54829 2/20 0.33
▸ PTPN2 P17706 1/20 0.33
▸ HSP90AB1 P08238 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29484423 0.79 PTPN5 (0.39) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL2514437 0.79 PTPN5 (0.39) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL29375864 0.78 NUDT1 (0.46) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL30899209 0.78 NUDT1 (0.46) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL761684 0.78 NUDT1 (0.46) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL30127784 0.77 NUDT1 (0.37) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL29375612 0.77 NUDT1 (0.37) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL29484425 0.77 GABRA1 (0.35) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL3272159 0.77 GABRA1 (0.46) HDAC4HDAC2HDAC8NUDT1BACE1
SCHEMBL757158 0.77 NUDT1 (0.37) HDAC4HDAC2HDAC8NUDT1BACE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107544209-A Positive photosensitive resin composition and use thereof 奇美实业股份有限公司 2018-01-05 — — CN disclosed
EP-1602977-B1 Positive resist composition and compound used therein TOKYO OHKA KOGYO CO LTD (JP) 2010-06-30 — — EP disclosed
US-7232643-B2 Positive resist composition and compound used therein TOKYO OHKA KOGYO CO., LTD. (JP) 2007-06-19 — — US disclosed
EP-1602977-A1 Positive resist composition and compound used therein TOKYO OHKA KOGYO CO., LTD. (JP) 2005-12-07 — — EP disclosed
US-20050266340-A1 Positive resist composition and compound used therein TOKYO OHKA KOGYO CO., LTD. (JP) 2005-12-01 — — US disclosed
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