Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN5 | P54829 | 4/20 | 0.39 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | FEN1 | P39748 | 2/20 | 0.37 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.37 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.37 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.37 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.36 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.35 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.34 |
| ▸ | BACE1 | P56817 | 1/20 | 0.34 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.34 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.34 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.34 |
| ▸ | TAS1R2 | Q8TE23 | 1/20 | 0.34 |
| ▸ | ALOX5AP | P20292 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2514437 | 1.00 | PTPN5 (0.39) | PTPN5PTPN2MEN1KMT2AFEN1 | |
| SCHEMBL9135944 | 0.92 | FEN1 (0.41) | PTPN5PTPN2MEN1KMT2AFEN1 | |
| SCHEMBL2530090 | 0.81 | HDAC4 (0.39) | MEN1KMT2AHDAC4HDAC2HDAC8 | |
| SCHEMBL15253060 | 0.80 | FEN1 (0.40) | PTPN5PTPN2MEN1KMT2AFEN1 | |
| SCHEMBL2513124 | 0.80 | FEN1 (0.36) | PTPN5PTPN2KMT2AFEN1PTGDR2 | |
| SCHEMBL29484429 | 0.80 | FEN1 (0.36) | PTPN5PTPN2KMT2AFEN1PTGDR2 | |
| SCHEMBL1053897 | 0.79 | HDAC4 (0.46) | PTPN5PTPN2MEN1KMT2AFEN1 | |
| SCHEMBL3273157 | 0.79 | HDAC4 (0.36) | PTPN5PTPN2MEN1KMT2AHDAC4 | |
| SCHEMBL9135740 | 0.79 | GABRA1 (0.34) | PTPN5PTPN2MEN1KMT2AHDAC4 | |
| SCHEMBL9138960 | 0.79 | GABRA1 (0.34) | PTPN5PTPN2MEN1KMT2AHDAC4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119575759-A | Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film | DIC株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-118672058-A | Photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-09-20 | — | — | CN | disclosed |
| CN-116209690-B | Phenolic hydroxyl group-containing resin, resin composition for alkali-developable resist, resist-curable resin composition, and method for producing phenolic hydroxyl group-containing resin | DIC株式会社 | 2024-09-06 | — | — | CN | disclosed |
| US-20240270891-A1 | PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKALINE DEVELOPABLE RESIST, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHENOLIC HYDROXY GROUP-CONTAINING RESIN | DIC CORPORATION (JP) | 2024-08-15 | — | — | US | disclosed |
| CN-118325004-A | Phenolic hydroxyl group-containing resin, photosensitive resin composition, curable composition, and resist film | DIC株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-114902135-B | Positive photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117321109-A | Phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-113227181-B | Resist composition | DIC株式会社 | 2023-07-18 | — | — | CN | disclosed |
| CN-116430671-A | Photoresist composition and photoetching process | 上海飞凯材料科技股份有限公司 | 2023-07-14 | — | — | CN | disclosed |
| CN-110959138-B | Resist material | DIC株式会社 | 2023-06-30 | — | — | CN | disclosed |
| CN-116209690-A | Phenolic hydroxyl group-containing resin, resin composition for alkali-developable resist, resist-curable resin composition, and method for producing phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-06-02 | — | — | CN | disclosed |
| CN-116023607-A | Phenolic hydroxyl group-containing resin | DIC株式会社 | 2023-04-28 | — | — | CN | disclosed |
| CN-115873214-A | Epoxy resin, photosensitive resin composition, resist film, curable composition, and cured film | DIC株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-107703717-B | Positive photosensitive resin composition, method for producing metal wiring, and laminate | 东京应化工业株式会社 | 2023-01-24 | — | — | CN | disclosed |
| US-11487204-B2 | Resist material | DIC CORPORATION (JP) | 2022-11-01 | — | — | US | disclosed |
| CN-114902135-A | Positive photosensitive resin composition, cured film and resist film | DIC株式会社 | 2022-08-12 | — | — | CN | disclosed |
| CN-114326300-A | Positive photoresist composition, preparation method and photoresist pattern forming method | 上海飞凯材料科技股份有限公司 | 2022-04-12 | — | — | CN | disclosed |
| WO-2022059448-A1 | METHOD FOR PRODUCING RESIST PATTERN, RESIST PATTERN AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR PRODUCTION OF TRANSPARENT MULTILAYER MEMBER | DIC株式会社 | 2022-03-24 | — | — | WO | disclosed |
| CN-107703685-B | Laminate and method for producing laminate | 东京应化工业株式会社 | 2022-03-18 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11487204-B2 | Resist material | FLNA, AFF1, RXRA | PTPN5 1869/4885PTPN2 2246/4885MEN1 4433/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.