SCHEMBL327370

SCHEMBL327370

O=S(=O)(ON=C(c1ccc2c(c1)Cc1ccccc1-2)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 2/20 0.42
HTR2C P28335 3/20 0.40
DRD2 P14416 3/20 0.40
HTR2B P41595 2/20 0.40
HTR2A P28223 2/20 0.40
ADRA1D P25100 1/20 0.40
HTR7 P34969 1/20 0.40
ADRA1A P35348 1/20 0.40
ADRA1B P35368 1/20 0.40
MAPT P10636 5/20 0.36
KDM4E B2RXH2 4/20 0.36
ALDH1A1 P00352 4/20 0.36
HPGD P15428 3/20 0.36
L3MBTL1 Q9Y468 1/20 0.35
SMN1; SMN2 Q16637 3/20 0.33
NPSR1 Q6W5P4 2/20 0.33
LMNA P02545 3/20 0.33
GAA P10253 1/20 0.33
HSD17B10 Q99714 1/20 0.33
MCHR1 Q99705 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1122055 1.00 SRD5A2 (0.42) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL20368726 1.00 SRD5A2 (0.42) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL13262372 0.98 SRD5A2 (0.42) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL20368725 0.98 SRD5A2 (0.42) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL12618690 0.96 SRD5A2 (0.37) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL12352790 0.94 SRD5A2 (0.42) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL178330 0.94 SRD5A2 (0.42) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL20364749 0.93 SRD5A2 (0.40) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL383954 0.92 SRD5A2 (0.38) SRD5A2HTR2CDRD2HTR2BHTR2A
SCHEMBL18820714 0.92 SRD5A2 (0.38) SRD5A2HTR2CDRD2HTR2BHTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 213 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3189083-B2 POLYCYCLIC PHOTOINITIATORS IGM GROUP B V (NL) 2023-07-05 EP disclosed
CN-107207456-B Latent acids and their use 巴斯夫欧洲公司 2021-05-04 CN disclosed
EP-3253735-B1 LATENT ACIDS AND THEIR USE BASF SE (DE) 2021-03-31 EP disclosed
US-10838302-B2 Cross-linkable fluorinated photopolymer ORTHOGONAL, INC. (US) 2020-11-17 US disclosed
CN-107251190-B Lithographic patterning of electronic devices 正交公司 2020-11-10 CN disclosed
CN-109790137-B Polycyclic glyoxylic acid esters as photoinitiators IGM集团公司 2020-10-30 CN disclosed
EP-3507279-B1 POLYCYCLIC GLYOXYLATES AS PHOTOINITIATORS IGM GROUP B V (NL) 2020-10-14 EP disclosed
US-20200301276-A1 CROSS-LINKABLE FLUORINATED PHOTOPOLYMER ORTHOGONAL, INC. (US) 2020-09-24 US disclosed
WO-2020163762-A1 FLUOROPOLYMER RESIST STRUCTURES HAVING AN UNDERCUT PROFILE ORTHOGONAL, INC. (US) 2020-08-13 WO disclosed
US-10739680-B2 Cross-linkable fluorinated photopolymer ORTHOGONAL, INC. (US) 2020-08-11 US disclosed
US-20080311515-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2008-12-18 US disclosed
US-20080292988-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD (JP) 2008-11-27 US disclosed
US-20080268376-A1 POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2008-10-30 US disclosed
US-20080248422-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR TOKYO OHKA KOGYO CO., LTD. (JP) 2008-10-09 US disclosed
US-7399577-B2 Halogenated oxime derivatives and the use thereof CIBA SPECIALTY CHEMICALS CORPORATION (US) 2008-07-15 US disclosed
US-20080145784-A1 Positive Resist Composition, Method For Resist Pattern Formation and Compound TOKYO OHKA KOGYO CO., LTD. (JP) 2008-06-19 US disclosed
US-20080090171-A1 POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2008-04-17 US disclosed
WO-2008022952-A1 UV-DOSIS INDICATORS CIBA HOLDING INC. (CH) 2008-02-28 WO disclosed
WO-2007147782-A2 OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS CIBA HOLDING INC. (CH) 2007-12-27 WO disclosed
EP-1772479-A1 Silicon coated release substrate Ciba Specialty Chemicals Holding Inc. (CH) 2007-04-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080248422-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR RER1, ACAD9, RRS1 SRD5A2 2923/4885HTR2C 4139/4885DRD2 1853/4885
US-20080145784-A1 Positive Resist Composition, Method For Resist Pattern Formation and Compound POLR1A, POLR2A, POLR2B SRD5A2 2710/4885HTR2C 1529/4885DRD2 334/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.