SCHEMBL3278459

SCHEMBL3278459

Cc1c(C)c2c(c(C)c1O)C(c1ccccc1)c1c(C)c(O)c(C)c(C)c1O2

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 2/20 0.51
IDO1 P14902 2/20 0.44
SIRT1 Q96EB6 5/20 0.38
ALDH1A1 P00352 3/20 0.37
GFER P55789 1/20 0.37
MAPT P10636 1/20 0.35
HPGD P15428 1/20 0.35
COMT P21964 1/20 0.35
ABL1 P00519 1/20 0.35
RIN1 Q13671 1/20 0.35
GAA P10253 1/20 0.35
SIRT2 Q8IXJ6 1/20 0.35
SIRT5 Q9NXA8 1/20 0.35
KDM1A O60341 2/20 0.33
MAOA P21397 2/20 0.33
MAOB P27338 2/20 0.33
MEN1 O00255 1/20 0.33
LMNA P02545 1/20 0.33
HTT P42858 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8282098 0.80 CYP19A1 (0.44) ALOX5IDO1SIRT1ALDH1A1GFER
SCHEMBL8772386 0.71 GAA (0.36) ALOX5IDO1ALDH1A1MAPTGAA
SCHEMBL9668101 0.71 ALOX5 (0.46) ALOX5IDO1ALDH1A1MAPTKDM1A
SCHEMBL21971076 0.71 IDO1 (0.36) ALOX5IDO1ALDH1A1HPGDABL1
SCHEMBL6900210 0.71 ALOX5 (0.44) ALOX5
SCHEMBL1673417 0.71 ALDH1A1 (0.44) IDO1ALDH1A1MAPTHPGDABL1
SCHEMBL6904469 0.67 ALOX5 (0.36) ALOX5
SCHEMBL6905384 0.67 ALOX5 (0.44) ALOX5
SCHEMBL11766816 0.66 ALOX5 (0.47) ALOX5MAPTGAAMEN1KMT2A
SCHEMBL2021933 0.65 IDO1 (0.39) IDO1ALDH1A1GFERMAPTABL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4290309-A1 RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-13 EP disclosed
EP-4012500-B1 RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM SHINETSU CHEMICAL CO (JP) 2023-03-01 EP disclosed
EP-4012500-A1 RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM Shin-Etsu Chemical Co., Ltd. (JP) 2022-06-15 EP disclosed
US-20100087618-A1 Linear (meth)acryloyl-containing compound, star (meth) acryloyl- containing compound, and method of manufacture DIC CORPORATION (JP) 2010-04-08 US disclosed
EP-2065419-A1 LINEAR (METH)ACRYLOYL-CONTAINING COMPOUND, STAR (METH)ACRYLOYL-CONTAINING COMPOUND AND PROCESS FOR PRODUCING THEM DIC Corporation (JP) 2009-06-03 EP disclosed
US-7514507-B2 Comb-shaped epoxy resin and method for preparing comb-shaped epoxy resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2009-04-07 US disclosed
US-20070142611-A1 Comb-shaped epoxy resin and method for preparing comb-shaped epoxy resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2007-06-21 US disclosed
US-6815481-B2 FUSED DIBENZO THERMAL STABILIZERS SUCH AS ANTHRACENE, XANTHENE AND ANTHRONE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-09 US disclosed
US-20020032256-A1 Polybutadiene composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-03-14 US disclosed