SCHEMBL3280071

SCHEMBL3280071

COc1ccc(C=NOS(=O)(=O)c2ccccc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.52
NPC1 O15118 2/20 0.52
RAB9A P51151 2/20 0.52
TDP1 Q9NUW8 1/20 0.52
ALDH1A1 P00352 7/20 0.48
SMN1; SMN2 Q16637 2/20 0.47
FAAH O00519 1/20 0.47
PTGS2 P35354 2/20 0.47
PTGS1 P23219 1/20 0.47
CA12 O43570 1/20 0.47
CA2 P00918 1/20 0.47
CA9 Q16790 1/20 0.47
TRPA1 O75762 1/20 0.46
LMNA P02545 1/20 0.46
THRB P10828 1/20 0.45
ATM Q13315 1/20 0.45
SNCA P37840 1/20 0.45
HTT P42858 1/20 0.45
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL214809 0.85 MAPT (0.46) MAPTNPC1RAB9ATDP1ALDH1A1
SCHEMBL214810 0.85 MAPT (0.46) MAPTNPC1RAB9ATDP1ALDH1A1
SCHEMBL3279890 0.81 TDP1 (0.51) MAPTNPC1RAB9ATDP1ALDH1A1
SCHEMBL3287126 0.80 NFE2L2 (0.44) MAPTNPC1RAB9AALDH1A1SMN1; SMN2
SCHEMBL14119460 0.79 ALDH1A1 (0.50) MAPTALDH1A1SMN1; SMN2FAAHPTGS2
SCHEMBL1932631 0.78 ALDH1A1 (0.75) MAPTNPC1RAB9ATDP1ALDH1A1
SCHEMBL1932629 0.78 ALDH1A1 (0.75) MAPTNPC1RAB9ATDP1ALDH1A1
SCHEMBL3279914 0.78 ALDH1A1 (0.47) MAPTNPC1RAB9ATDP1ALDH1A1
SCHEMBL17256742 0.78 SMN1; SMN2 (0.50) MAPTNPC1RAB9ATDP1ALDH1A1
SCHEMBL17256743 0.78 SMN1; SMN2 (0.50) MAPTNPC1RAB9ATDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7897319-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-03-01 US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 US disclosed
US-20070259273-A1 Positive Resist Composition and Method of Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-11-08 US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern ADH1A, ADH1C, POLR1A MAPT 716/4885NPC1 2588/4885RAB9A 2800/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.