SCHEMBL3280356

SCHEMBL3280356

O=S(=O)(O/N=[C]/c1ccc(Cl)cc1Cl)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 2/20 0.43
▸ FLT1 P17948 3/20 0.39
▸ FLT4 P35916 3/20 0.39
▸ KDR P35968 3/20 0.39
▸ NPSR1 Q6W5P4 4/20 0.37
▸ GAA P10253 1/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.37
▸ KDM4E B2RXH2 2/20 0.35
▸ ALDH1A1 P00352 4/20 0.35
▸ MAPT P10636 4/20 0.35
▸ HSP90AA1 P07900 3/20 0.35
▸ XBP1 P17861 3/20 0.35
▸ MPI P34949 3/20 0.35
▸ ERBB2 P04626 1/20 0.35
▸ HSP90AB1 P08238 1/20 0.35
▸ PGR P06401 1/20 0.34
▸ KIF18A Q8NI77 1/20 0.34
▸ GLA P06280 1/20 0.34
▸ S1PR2 O95136 2/20 0.33
▸ LMNA P02545 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3280359 1.00 TDP1 (0.43) TDP1FLT1FLT4KDRNPSR1
SCHEMBL3279887 0.79 TDP1 (0.51) TDP1NPSR1GAAKDM4EALDH1A1
SCHEMBL3279882 0.79 TDP1 (0.51) TDP1NPSR1GAAKDM4EALDH1A1
SCHEMBL3281140 0.76 TDP1 (0.47) TDP1FLT1FLT4KDRGAA
SCHEMBL3281138 0.76 TDP1 (0.47) TDP1FLT1FLT4KDRGAA
SCHEMBL3280618 0.76 TDP1 (0.40) TDP1NPSR1GAASMN1; SMN2KDM4E
SCHEMBL3280620 0.76 TDP1 (0.40) TDP1NPSR1GAASMN1; SMN2KDM4E
SCHEMBL3280361 0.71 CYP1A2 (0.44) TDP1FLT1FLT4KDRNPSR1
SCHEMBL14480136 0.70 TP53 (0.38) TDP1KDM4EALDH1A1MAPTLMNA
SCHEMBL14480137 0.70 TP53 (0.38) TDP1KDM4EALDH1A1MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7897319-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-03-01 — — US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 — — US disclosed
US-20070259273-A1 Positive Resist Composition and Method of Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-11-08 — — US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern ADH1A, ADH1C, POLR1A TDP1 855/4885FLT1 1577/4885FLT4 2922/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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