SCHEMBL3279887

SCHEMBL3279887

O=S(=O)(ON=[C]c1ccc(Cl)cc1)c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 4/20 0.51
▸ KDM4E B2RXH2 4/20 0.41
▸ ENPP3 O14638 1/20 0.38
▸ ENPP1 P22413 1/20 0.38
▸ MAPT P10636 7/20 0.38
▸ ALDH1A1 P00352 5/20 0.38
▸ XBP1 P17861 4/20 0.38
▸ MPI P34949 4/20 0.38
▸ NPSR1 Q6W5P4 4/20 0.38
▸ HSD11B1 P28845 2/20 0.38
▸ HSP90AA1 P07900 2/20 0.38
▸ GAA P10253 2/20 0.38
▸ KMT2A Q03164 4/20 0.37
▸ MEN1 O00255 2/20 0.37
▸ LMNA P02545 4/20 0.36
▸ S1PR2 O95136 3/20 0.36
▸ RAB9A P51151 2/20 0.36
▸ PKM P14618 2/20 0.36
▸ HTT P42858 2/20 0.36
▸ OPRM1 P35372 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3279882 1.00 TDP1 (0.51) TDP1KDM4EENPP3ENPP1MAPT
SCHEMBL3281138 0.94 TDP1 (0.47) TDP1KDM4EMAPTALDH1A1GAA
SCHEMBL3281140 0.94 TDP1 (0.47) TDP1KDM4EMAPTALDH1A1GAA
SCHEMBL3280063 0.81 ALDH1A1 (0.43) TDP1MAPTALDH1A1XBP1MPI
SCHEMBL3280059 0.81 ALDH1A1 (0.43) TDP1MAPTALDH1A1XBP1MPI
SCHEMBL3280359 0.79 TDP1 (0.43) TDP1KDM4EENPP3ENPP1MAPT
SCHEMBL3280356 0.79 TDP1 (0.43) TDP1KDM4EENPP3ENPP1MAPT
SCHEMBL3279910 0.77 MEN1 (0.46) TDP1KDM4EMAPTALDH1A1XBP1
SCHEMBL3280620 0.77 TDP1 (0.40) TDP1KDM4EMAPTALDH1A1XBP1
SCHEMBL3279903 0.77 MEN1 (0.46) TDP1KDM4EMAPTALDH1A1XBP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7897319-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-03-01 — — US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 — — US disclosed
US-20070259273-A1 Positive Resist Composition and Method of Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-11-08 — — US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern ADH1A, ADH1C, POLR1A TDP1 855/4885KDM4E 1567/4885ENPP3 4015/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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