SCHEMBL3281140

SCHEMBL3281140

O=S(=O)(ON=[C]c1ccccc1)c1ccc(Cl)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.47
▸ KDM4E B2RXH2 2/20 0.44
▸ GAA P10253 2/20 0.40
▸ MAPT P10636 1/20 0.40
▸ MEN1 O00255 3/20 0.40
▸ KMT2A Q03164 3/20 0.40
▸ ALDH1A1 P00352 2/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ MAPK1 P28482 1/20 0.38
▸ HPGD P15428 1/20 0.38
▸ PGR P06401 2/20 0.37
▸ TP53 P04637 1/20 0.37
▸ FLT1 P17948 1/20 0.36
▸ FLT4 P35916 1/20 0.36
▸ KDR P35968 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36
▸ CA12 O43570 1/20 0.36
▸ CA1 P00915 1/20 0.36
▸ CA2 P00918 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3281138 1.00 TDP1 (0.47) TDP1KDM4EGAAMAPTMEN1
SCHEMBL3279882 0.94 TDP1 (0.51) TDP1KDM4EGAAMAPTMEN1
SCHEMBL3279887 0.94 TDP1 (0.51) TDP1KDM4EGAAMAPTMEN1
SCHEMBL10643770 0.84 ESR1 (0.40) TDP1KDM4EGAAMAPTMEN1
SCHEMBL3279903 0.84 MEN1 (0.46) TDP1KDM4EGAAMAPTMEN1
SCHEMBL3279910 0.84 MEN1 (0.46) TDP1KDM4EGAAMAPTMEN1
SCHEMBL3278594 0.80 CA2 (0.44) MAPTMEN1KMT2AALDH1A1MAPK1
SCHEMBL3278596 0.80 CA2 (0.44) MAPTMEN1KMT2AALDH1A1MAPK1
SCHEMBL3280359 0.76 TDP1 (0.43) TDP1KDM4EGAAMAPTMEN1
SCHEMBL3280356 0.76 TDP1 (0.43) TDP1KDM4EGAAMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7897319-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-03-01 — — US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 — — US disclosed
US-20070259273-A1 Positive Resist Composition and Method of Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-11-08 — — US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern ADH1A, ADH1C, POLR1A TDP1 855/4885KDM4E 1567/4885GAA 2730/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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