Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MCHR1 | Q99705 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.33 |
| ▸ | MEP1B | Q16820 | 1/20 | 0.32 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21466550 | 1.00 | MCHR1 (0.37) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL18379791 | 1.00 | MCHR1 (0.37) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL18714955 | 1.00 | MCHR1 (0.37) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL19055333 | 1.00 | MCHR1 (0.37) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL18379792 | 1.00 | MCHR1 (0.37) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL13697530 | 0.84 | MCHR1 (0.34) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL6384052 | 0.81 | MCHR1 (0.39) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL9319731 | 0.80 | MCHR1 (0.36) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL19879625 | 0.78 | MCHR1 (0.35) | MCHR1MEN1KMT2ANPC1RAB9A | |
| SCHEMBL10449141 | 0.78 | MEN1 (0.34) | MEN1KMT2ANPC1RAB9ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350296-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |
| EP-4230621-A1 | SUBSTITUTED N-BENZOIC ACID URACILS, THEIR SALTS AND USE OF SAID COMPOUNDS AS HERBICIDAL AGENTS | Bayer AG (DE) | 2023-08-23 | — | — | EP | disclosed |
| EP-4230620-A1 | SUBSTITUTED N-AMINO-N-BENZOIC ACID URACILS, THEIR SALTS AND USE OF SAID COMPOUNDS AS HERBICIDAL AGENTS | Bayer Aktiengesellschaft (DE) | 2023-08-23 | — | — | EP | disclosed |
| US-20160326108-A1 | PYRROLIDINYL SULFONE DERIVATIVES AND THEIR USE AS ROR GAMMA MODULATORS | BRISTOL MYERS SQUIBB CO (US) | 2016-11-10 | — | — | US | disclosed |
| US-9458171-B2 | Pyrrolidinyl sulfone RORγ modulators | BRISTOL-MYERS SQUIBB COMPANY (US) | 2016-10-04 | — | — | US | disclosed |
| US-20150191483-A1 | PYRROLIDINYL SULFONE RORGAMMA MODULATORS | BRISTOL-MYERS SQUIBB COMPANY | 2015-07-09 | — | — | US | disclosed |
| US-8900791-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | FUJIFILM CORPORATION (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20120276483-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | disclosed |
| US-20120276483-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | disclosed |
| US-20120065347-A1 | FLUOROCOMPOUND HAVING HIGHLY FLUORINATED NORBORNANE STRUCTURE, FLUOROPOLYMER, AND THEIR PRODUCTION PROCESSES | ASAHI GLASS COMPANY LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| US-8134033-B2 | Fluorocompound having highly fluorinated norbornane structure, fluoropolymer, and their production processes | ASAHI GLASS COMPANY, LIMITED (JP) | 2012-03-13 | — | — | US | disclosed |
| US-20110236826-A1 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | US | disclosed |
| WO-2010035905-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | WO | disclosed |
| US-20090192330-A1 | FLUOROCOMPOUND HAVING HIGHLY FLUORINATED NORBORNANE STRUCTURE, FLUOROPOLYMER, AND THEIR PRODUCTION PROCESSES | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-07-30 | — | — | US | disclosed |
| US-20080020289-A1 | Novel polymer, positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| CN-1205261-C | Polyolefin compsn. contg. low viscosity propylene homopolymers, fiber and extensible non-woven fabric prepared therefrom | BASELL TECH CO B V (NL) | 2005-06-08 | — | — | CN | disclosed |
| CN-1383442-A | Polyolefin compsn. contg. low viscosity propylene homopolymers, fiber and extensible non-woven fabric prepared therefrom | BASELL TECH CO B V (NL) | 2002-12-04 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120065347-A1 | FLUOROCOMPOUND HAVING HIGHLY FLUORINATED NORBORNANE STRUCTURE, FLUOROPOLYMER, AND THEIR PRODUCTION PROCESSES | PFAS, AFF1, CYP1B1 | MCHR1 2340/4885MEN1 344/4885KMT2A 2427/4885 |
| US-20110236826-A1 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND | PARG, RAD51, CD38 | MCHR1 3993/4885MEN1 428/4885KMT2A 463/4885 |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | ARSA, RAD51, ARID2 | MCHR1 4122/4885MEN1 2393/4885KMT2A 2772/4885 |
| US-20160326108-A1 | PYRROLIDINYL SULFONE DERIVATIVES AND THEIR USE AS ROR GAMMA MODULATORS | RORC, RORB, RORA | MCHR1 854/4885MEN1 4281/4885KMT2A 3798/4885 |
| US-20150191483-A1 | PYRROLIDINYL SULFONE RORGAMMA MODULATORS | RORC, RORB, RORA | MCHR1 547/4885MEN1 4279/4885KMT2A 3540/4885 |
| US-20090192330-A1 | FLUOROCOMPOUND HAVING HIGHLY FLUORINATED NORBORNANE STRUCTURE, FLUOROPOLYMER, AND THEIR PRODUCTION PROCESSES | CWC22, PARP2, AFF2 | MCHR1 3563/4885MEN1 1037/4885KMT2A 776/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.