SCHEMBL3288497

SCHEMBL3288497

O=C(OC1CCC1)C1C2C=CC(C2)C1C(=O)OC1CCC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP7 O15540 1/20 0.41
FABP5 Q01469 1/20 0.41
LMNA P02545 1/20 0.41
ALDH1A1 P00352 3/20 0.40
POLB P06746 2/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
SLC6A4 P31645 2/20 0.39
SLC6A3 Q01959 2/20 0.39
CHRNA1 P02708 1/20 0.39
CHRNG P07510 1/20 0.39
ITGA5 P08648 1/20 0.39
CHRNB1 P11230 1/20 0.39
CHRNB2 P17787 1/20 0.39
SLC6A2 P23975 1/20 0.39
CHRNB4 P30926 1/20 0.39
CHRNA3 P32297 1/20 0.39
CHRNA4 P43681 1/20 0.39
CHRND Q07001 1/20 0.39
CYP3A4 P08684 1/20 0.38
TSHR P16473 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3286002 0.96 FABP7 (0.45) FABP7FABP5LMNAALDH1A1POLB
SCHEMBL1614779 0.94 FABP7 (0.47) FABP7FABP5LMNAALDH1A1POLB
SCHEMBL3288527 0.94 FABP7 (0.47) FABP7FABP5LMNAALDH1A1POLB
SCHEMBL5837269 0.89 FABP7 (0.51) FABP7FABP5LMNAALDH1A1POLB
SCHEMBL5837271 0.89 FABP7 (0.51) FABP7FABP5LMNAALDH1A1POLB
SCHEMBL15611584 0.88 FABP7 (0.54) FABP7FABP5LMNAALDH1A1POLB
SCHEMBL2140237 0.83 ALDH1A1 (0.37) FABP7FABP5LMNAALDH1A1POLB
SCHEMBL2137771 0.81 ADRA2A (0.38) FABP7FABP5LMNAALDH1A1POLB
SCHEMBL31092875 0.79 FABP7 (0.42) FABP7FABP5LMNASLC6A4SLC6A3
SCHEMBL3367480 0.79 MAPT (0.46) LMNAALDH1A1POLBSMN1; SMN2SLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7713680-B2 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR CORPORATION (JP) 2010-05-11 US disclosed
US-20080233515-A1 RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE JSR CORPORATION (JP) 2008-09-25 US disclosed
EP-1972673-A1 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR Corporation (JP) 2008-09-24 EP disclosed