Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.43 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.41 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3286002 | 0.79 | FABP7 (0.45) | CYP19A1SMN1; SMN2HTTALDH1A1POLB | |
| SCHEMBL3288497 | 0.79 | FABP7 (0.41) | SMN1; SMN2HTTALDH1A1POLBLMNA | |
| SCHEMBL951446 | 0.79 | MAPT (0.42) | MAPTCYP19A1APOBEC3AAPOBEC3GSMN1; SMN2 | |
| SCHEMBL3288527 | 0.78 | FABP7 (0.47) | CYP19A1SMN1; SMN2ALDH1A1POLBLMNA | |
| SCHEMBL1614779 | 0.78 | FABP7 (0.47) | CYP19A1SMN1; SMN2ALDH1A1POLBLMNA | |
| SCHEMBL30663533 | 0.77 | MAPT (0.38) | MAPTCYP19A1APOBEC3AAPOBEC3GSMN1; SMN2 | |
| SCHEMBL2140237 | 0.75 | ALDH1A1 (0.37) | SMN1; SMN2HTTALDH1A1POLBLMNA | |
| SCHEMBL5837271 | 0.73 | FABP7 (0.51) | SMN1; SMN2KDM4EALDH1A1POLBLMNA | |
| SCHEMBL5837269 | 0.73 | FABP7 (0.51) | SMN1; SMN2KDM4EALDH1A1POLBLMNA | |
| SCHEMBL83128 | 0.73 | MAPT (0.50) | MAPTCYP19A1APOBEC3AAPOBEC3GSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| EP-1085379-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-6964840-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-15 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-20040241580-A1 | Radiation-sensitive resin composition | NISHIMURA YUKIO (JP) | 2004-12-02 | — | — | US | disclosed |
| US-6800414-B2 | FLUOROPOLYMER | JSR CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| US-6753124-B2 | AMPLIFIED POSITIVE PHOTORESISTS | JSR CORPORATION (JP) | 2004-06-22 | — | — | US | disclosed |
| US-6623907-B2 | Chemical amplified photoresist | JSR CORPORATION (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |