SCHEMBL3294090

SCHEMBL3294090

CC1C2C=CC(O2)C1C(=O)O

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 5/20 0.52
TDP1 Q9NUW8 2/20 0.46
POLB P06746 1/20 0.46
CTDSP1 Q9GZU7 1/20 0.46
ALDH1A1 P00352 5/20 0.41
KMT2A Q03164 3/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
KDM4E B2RXH2 2/20 0.41
TP53 P04637 1/20 0.41
GAA P10253 1/20 0.41
MEN1 O00255 1/20 0.41
PPP5C P53041 1/20 0.39
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
HSD17B10 Q99714 1/20 0.38
USP2 O75604 1/20 0.37
TSHR P16473 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13480836 0.83 PPM1B (0.61) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL13897079 0.83 PPM1B (0.61) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL9697481 0.83 PPM1B (0.61) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL6778458 0.83 PPM1B (0.61) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL11393084 0.83 PPM1B (0.61) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL1005051 0.83 PPM1B (0.61) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL19189283 0.80 PPM1B (0.38) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL9880145 0.77 PPM1B (0.56) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL819846 0.77 PPM1B (0.56) PPM1BTDP1POLBCTDSP1ALDH1A1
SCHEMBL16675540 0.77 PPM1B (0.56) PPM1BTDP1POLBCTDSP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021155470-A1 PSILOCIN DERIVATIVES AS SEROTONERGIC PSYCHEDELIC AGENTS FOR THE TREATMENT OF CNS DISORDERS MINDSET PHARMA INC. (CA) 2021-08-12 WO disclosed
US-7727705-B2 High etch resistant underlayer compositions for multilayer lithographic processes FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2010-06-01 US disclosed
WO-2008140846-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-11-20 WO disclosed
US-20080206667-A1 HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2008-08-28 US disclosed
US-6372854-B1 POLYALKENAMERS USED AS PHOTORESISTS HAVING EXCELLENT OPTICAL ELECTRICAL PROPERTIES; HIGH RIGIDITY; HEAT RESISTANCE; ADHESION AND WEAR RESISTANCE; HYDROGENATION; ACIDOLYSIS MITSUI CHEMICALS, INC. (JP) 2002-04-16 US disclosed