SCHEMBL819846

SCHEMBL819846

CC(=O)C1C2C=CC(O2)C1C(=O)O

nearest known ligand 0.56

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 5/20 0.56
ALDH1A1 P00352 6/20 0.45
KMT2A Q03164 3/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
KDM4E B2RXH2 2/20 0.45
TDP1 Q9NUW8 2/20 0.45
TP53 P04637 1/20 0.45
GAA P10253 1/20 0.45
MEN1 O00255 1/20 0.45
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
HSD17B10 Q99714 1/20 0.41
POLB P06746 1/20 0.41
CTDSP1 Q9GZU7 1/20 0.41
USP2 O75604 1/20 0.40
TSHR P16473 1/20 0.40
LMNA P02545 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16675540 1.00 PPM1B (0.56) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL9880145 1.00 PPM1B (0.56) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL14516610 0.91 PPM1B (0.44) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL13480836 0.88 PPM1B (0.61) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL13897079 0.88 PPM1B (0.61) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL6778458 0.88 PPM1B (0.61) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL1005051 0.88 PPM1B (0.61) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL11393084 0.88 PPM1B (0.61) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL9697481 0.88 PPM1B (0.61) PPM1BALDH1A1KMT2AL3MBTL1KDM4E
SCHEMBL13002242 0.77 PPM1B (0.52) PPM1BALDH1A1KMT2AL3MBTL1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9176381-B2 Positive type photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2015-11-03 US disclosed
US-9176381-B2 Positive type photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2015-11-03 US disclosed
US-20140072806-A1 POLYMER COMPOSITIONS AND METHODS NOVOMER, INC. (US) 2014-03-13 US disclosed
US-8318401-B2 Positive typed photosensitive composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-11-27 US disclosed
US-8318401-B2 Positive typed photosensitive composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-11-27 US disclosed
US-20110183115-A1 POSITIVE TYPED PHOTOSENSITIVE COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2011-07-28 US disclosed
US-20110183115-A1 POSITIVE TYPED PHOTOSENSITIVE COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2011-07-28 US disclosed
EP-2292695-A1 Positive type photosensitive composition Korea Kumho Petrochemical Co. Ltd. (KR) 2011-03-09 EP disclosed
US-20110053081-A1 Positive Type Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
US-20110053081-A1 Positive Type Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
US-20110053080-A1 Positive Typed Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
US-20110053080-A1 Positive Typed Photosensitive Composition KOREA KUMHO PETROCHEMICAL CO., LTD (KR) 2011-03-03 US disclosed
EP-2290005-A1 Positive type photosensitive composition Korea Kumho Petrochemical Co. Ltd. (KR) 2011-03-02 EP disclosed
US-20100047539-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-02-25 US disclosed
US-20100047539-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-02-25 US disclosed