Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
| ▸ | DRD2 | P14416 | 3/20 | 0.36 |
| ▸ | DRD4 | P21917 | 3/20 | 0.36 |
| ▸ | DRD3 | P35462 | 3/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | MITF | O75030 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | LTA4H | P09960 | 2/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TEAD4 | Q15561 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | PTGES | O14684 | 1/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.33 |
| ▸ | PPARG | P37231 | 1/20 | 0.33 |
| ▸ | PPARA | Q07869 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705034 | 0.82 | LTA4H (0.47) | DRD2DRD3HTTALDH1A1LMNA | |
| SCHEMBL8709219 | 0.73 | NPC1 (0.37) | HTTALDH1A1SMN1; SMN2MAPTHPGD | |
| SCHEMBL109524 | 0.72 | DRD2 (0.63) | DRD2DRD4DRD3LTA4HCYP3A4 | |
| Butane SCHEMBL14858436 | 0.70 | DRD2 (0.61) | DRD2DRD4DRD3LTA4HCYP3A4 | |
| P-Xylene SCHEMBL6129268 | 0.69 | ACHE (0.57) | ACHEHTTALDH1A1TSHRHPGD | |
| P-Xylene SCHEMBL28089202 | 0.69 | ACHE (0.57) | ACHEHTTALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL3295650 | 0.69 | CYP2C19 (0.38) | DRD2DRD4ALDH1A1SMN1; SMN2TSHR | |
| P-Xylene SCHEMBL27374298 | 0.69 | TSHR (0.50) | ACHEDRD2DRD4DRD3HTT | |
| SCHEMBL6377570 | 0.68 | NR5A1 (0.64) | DRD2DRD4DRD3LTA4HCYP3A4 | |
| SCHEMBL705351 | 0.68 | LTA4H (0.41) | HTTLMNALTA4HTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1641908-B1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2010-11-17 | — | — | EP | disclosed |
| US-7736837-B2 | Antireflective coating composition based on silicon polymer | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-06-15 | — | — | US | disclosed |
| US-20100093969-A1 | Process for making siloxane polymers | ZHANG RUZHI | 2010-04-15 | — | — | US | disclosed |
| EP-2132253-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ Electronic Materials USA Corp. (US) | 2009-12-16 | — | — | EP | disclosed |
| EP-2129733-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ Electronic Materials USA Corp. (US) | 2009-12-09 | — | — | EP | disclosed |
| EP-2035518-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ Electronic Materials USA Corp. (US) | 2009-03-18 | — | — | EP | disclosed |
| US-7442675-B2 | Cleaning composition and method of cleaning semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-28 | — | — | US | disclosed |
| WO-2008104874-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-09-04 | — | — | WO | disclosed |
| WO-2008102259-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-28 | — | — | WO | disclosed |
| US-20080199789-A1 | Antireflective Coating Composition Based on Silicon Polymer | MERCK PATENT GMBH (DE) | 2008-08-21 | — | — | US | disclosed |
| US-20070298349-A1 | Antireflective Coating Compositions Comprising Siloxane Polymer | AZ ELECTRONIC MATERIALS USA CORP. | 2007-12-27 | — | — | US | disclosed |
| WO-2007148223-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-12-27 | — | — | WO | disclosed |
| EP-1641908-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2004113486-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-29 | — | — | WO | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |