Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 4/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.36 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.35 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.35 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.35 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.35 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705034 | 0.87 | LTA4H (0.47) | LTA4HCA4KCNA3LMNAHTT | |
| SCHEMBL28728730 | 0.85 | LTA4H (0.47) | LTA4HTSHRKCNA3LMNAHTT | |
| SCHEMBL707316 | 0.81 | CA4 (0.42) | LTA4HCA4TSHRKCNA3CHRNB2 | |
| Butane SCHEMBL2501351 | 0.76 | LTA4H (0.43) | LTA4HCA4TSHRKCNA3CHRNB2 | |
| SCHEMBL31187705 | 0.74 | LTA4H (0.35) | LTA4HCA4LMNA | |
| SCHEMBL28728849 | 0.74 | LTA4H (0.52) | LTA4HKCNA3CHRNB2CHRNB4CHRNA3 | |
| SCHEMBL28459964 | 0.72 | CA1 (0.52) | CA4TSHRL3MBTL1LMNAHTT | |
| SCHEMBL705340 | 0.72 | HRH1 (0.43) | LMNAHTT | |
| SCHEMBL27809250 | 0.71 | TAAR1 (0.44) | LTA4HCA4TSHRKCNA3 | |
| SCHEMBL28653063 | 0.71 | LMNA (0.34) | LTA4HCA4L3MBTL1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023190168-A1 | CURED FILM FORMING METHOD, METHOD FOR MANUFACTURING SUBSTRATE FOR IMPRINT MOLD, METHOD FOR MANUFACTURING IMPRINT MOLD, METHOD FOR MANUFACTURING UNEVEN STRUCTURE, PATTERN FORMING METHOD, HARD MASK FORMING METHOD, INSULATING FILM FORMING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 大日本印刷株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0529583-B1 | 3-(Vinylphenyloxy) propylsilane compound | SHINETSU CHEMICAL CO (JP) | 1997-11-26 | — | — | EP | disclosed |
| CN-1111601-A | Method for producing refractory molded article and binder for refractory molded article | JAPAN CASTING TECHNOLOGY CONSU (JP) | 1995-11-15 | — | — | CN | disclosed |